SCHEMBL18855331

SCHEMBL18855331

Oc1c(I)cc(C(c2ccc(C(c3cc(I)c(O)c(I)c3)c3cc(I)c(O)c(I)c3)cc2)c2cc(I)c(O)c(I)c2)cc1I

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 2/20 0.48
ALB P02768 1/20 0.39
HTT P42858 3/20 0.37
LMNA P02545 3/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
GABRA1 P14867 1/20 0.34
GABRB1 P18505 1/20 0.34
GABRB2 P47870 1/20 0.34
MAPK14 Q16539 2/20 0.33
ESR1 P03372 2/20 0.33
RNASEH1 O60930 1/20 0.33
PDCD1 Q15116 1/20 0.33
ESR2 Q92731 1/20 0.33
CD274 Q9NZQ7 1/20 0.33
CHEK1 O14757 1/20 0.33
DAPK3 O43293 1/20 0.33
RET P07949 1/20 0.33
PDGFRB P09619 1/20 0.33
PIM1 P11309 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26696424 0.93 ESR1 (0.44) TTRALBLMNAMEN1KMT2A
SCHEMBL18643164 0.91 TTR (0.41) TTRALBHTTLMNAMEN1
SCHEMBL18643629 0.91 TTR (0.41) TTRALBHTTLMNAMEN1
SCHEMBL18855330 0.87 TTR (0.41) TTRALBHTTLMNAMEN1
SCHEMBL26696419 0.82 NQO1 (0.47) LMNAMEN1KMT2ATDP1ALDH1A1
SCHEMBL23627377 0.81 TTR (0.44) TTRALBHTTLMNAMEN1
SCHEMBL21774693 0.81 TTR (0.44) TTRALBHTTLMNAMEN1
SCHEMBL31375413 0.80 SHBG (0.47) TTRHTTLMNAESR1RNASEH1
SCHEMBL26696421 0.80 SHBG (0.47) TTRHTTLMNAESR1RNASEH1
SCHEMBL18855334 0.79 TTR (0.31) TTRPTGS1PTGS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2743249-B1 CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN MITSUBISHI GAS CHEMICAL CO (JP) 2019-07-24 EP disclosed
US-9651864-B2 Negative resist composition, method for producing relief pattern using the same, and electronic component using the same DAI NIPPON PRINTING CO., LTD. (JP) 2017-05-16 US disclosed