SCHEMBL2178103

SCHEMBL2178103

CCONCc1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.48
MAPT P10636 2/20 0.48
KDM4E B2RXH2 1/20 0.48
IDO1 P14902 3/20 0.44
THRB P10828 1/20 0.44
HRAS P01112 1/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
TDP1 Q9NUW8 1/20 0.44
TP53 P04637 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.43
PPID Q08752 1/20 0.42
HTT P42858 1/20 0.41
SIGMAR1 Q99720 1/20 0.41
EPHX2 P34913 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL27547964 0.98 MAPT (0.52) CYP3A4MAPTKDM4EIDO1THRB
Water SCHEMBL27527749 0.98 CYP3A4 (0.52) CYP3A4MAPTKDM4EIDO1THRB
Dimethylamine SCHEMBL28814481 0.96 CYP3A4 (0.50) CYP3A4MAPTKDM4EIDO1THRB
Chloromethane SCHEMBL27446335 0.96 CYP3A4 (0.45) CYP3A4MAPTKDM4EIDO1THRB
SCHEMBL28339272 0.90 KCNH2 (0.43) CYP3A4MAPTKDM4EIDO1THRB
Sulfuric Acid SCHEMBL27885484 0.89 CA2 (0.46) CYP3A4MAPTKDM4EIDO1THRB
Sulfuric Acid SCHEMBL27885483 0.89 CA2 (0.46) CYP3A4MAPTKDM4EIDO1THRB
Bicarbonate SCHEMBL28338933 0.87 SMN1; SMN2 (0.46) CYP3A4MAPTHRASMEN1KMT2A
Benzaldehyde SCHEMBL7800457 0.86 ALDH1A1 (0.47) CYP3A4MAPTKDM4ETHRBHRAS
SCHEMBL29102028 0.84 HTT (0.43) MAPTHRASSMN1; SMN2PPIDHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 240 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12545810-B2 Magnetic polishing slurry and method for polishing a workpiece TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (TW) 2026-02-10 US claimed
US-12448542-B2 Slurry composition for polishing organic film KCTECH CO., LTD. (KR) 2025-10-21 US claimed
US-12305079-B2 CMP slurry composition for polishing polycrystalline silicon and polishing method using same KCTECH CO., LTD. (KR) 2025-05-20 US claimed
US-20250145859-A1 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING KCTECH CO., LTD. (KR) 2025-05-08 US claimed
EP-4389840-A1 A CHARACTERISTIC STUDY OF ACRYLIC POLYMER DISPERSANT COATED ON SURFACE OF POLISHING PARTICLE Hannam University Industry Academy Cooperation Foundation (KR) 2024-06-26 EP claimed
US-20240199916-A1 A CHARACTERISTIC STUDY OF ACRYLIC POLYMER DISPERSANT COATED ON SURFACE OF POLISHING PARTICLE HANNAM UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION (KR) 2024-06-20 US claimed
CN-114867802-B Slurry composition for polishing organic film 凯斯科技股份有限公司 2024-02-20 CN claimed
CN-114957510-B Functionalized modified polydextrose sorbitol carboxymethyl ether and preparation method thereof 西安超磁纳米生物科技有限公司 2023-07-04 CN claimed
CN-113260687-B CMP slurry composition for polishing polysilicon and polishing method using the same 凯斯科技股份有限公司 2023-05-30 CN claimed
US-20230033789-A1 SLURRY COMPOSITION FOR POLISHING ORGANIC FILM KCTECH CO., LTD. (KR) 2023-02-02 US claimed
CN-100399895-C Preservative blends containing quaternary ammonium compounds LONZA AG (US) 2008-07-09 CN claimed
CN-1947505-A Preservative blends containing quaternary ammonium compounds LONZA AG (US) 2007-04-18 CN claimed
CN-1946410-A Anti-viral pharmaceutical compositions XIAN CHEN ANDREW (US) 2007-04-11 CN claimed
CN-1281129-C Preservative mixtures containing quaternary ammonium compounds LONZA AG (US) 2006-10-25 CN claimed
US-20060213126-A1 Method for preparing a polishing slurry having high dispersion stability SAMSUNG CORNING PRECISION GLASS CO., LTD. (KR) 2006-09-28 US claimed
CN-1230449-C Heparin-derived polysaccharide mixtures, process for their preparation and pharmaceutical compositions containing them AVENTIS PHARMA SA (FR) 2005-12-07 CN claimed
CN-1523959-A Preservative mixtures containing quaternary ammonium compounds ¡ 2004-08-25 CN claimed
CN-1447820-A Heparin-derived polysaccharide mixtures, process for their preparation and pharmaceutical compositions containing them AVENTIS PHARMA SA (FR) 2003-10-08 CN claimed
US-4268510-A DEMETHANIZATION, METABOLISM, RUMEN IMPERIAL CHEMICAL INDUSTRIES LIMITED (GB) 1981-05-19 US claimed
EP-0010348-A1 Heterocyclic trichloromethyl derivatives, process for their preparation and their use IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1980-04-30 EP claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12545810-B2 Magnetic polishing slurry and method for polishing a workpiece CHKB, SMARCE1, SIK2 CYP3A4 1514/4885MAPT 2343/4885KDM4E 147/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.