SCHEMBL21783767

SCHEMBL21783767

CCCN(CCOC(=O)c1cc(I)cc(I)c1I)C(=O)OC(C)(C)C

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.33
KMT2A Q03164 1/20 0.32
ALDH1A1 P00352 1/20 0.31
SCN1A P35498 2/20 0.31
SCN2A Q99250 2/20 0.31
SCN3A Q9NY46 2/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2D6 P10635 1/20 0.31
HDAC3 O15379 1/20 0.31
HDAC4 P56524 1/20 0.31
HDAC1 Q13547 1/20 0.31
HDAC7 Q8WUI4 1/20 0.31
HDAC2 Q92769 1/20 0.31
HDAC10 Q969S8 1/20 0.31
HDAC11 Q96DB2 1/20 0.31
HDAC8 Q9BY41 1/20 0.31
HDAC6 Q9UBN7 1/20 0.31
HDAC9 Q9UKV0 1/20 0.31
HDAC5 Q9UQL6 1/20 0.31
CHRM2 P08172 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426586 0.78 HDAC3 (0.36) ESR1KMT2AALDH1A1SCN1ASCN2A
SCHEMBL22097503 0.78
SCHEMBL26426576 0.76 HTR3A (0.47) KMT2ASCN1ASCN2ASCN3ACYP1A2
SCHEMBL21783823 0.76 HTR3A (0.50) KMT2ASCN1ASCN2ASCN3ACYP1A2
SCHEMBL26426574 0.76 HDAC3 (0.38) ESR1KMT2AALDH1A1SCN1ASCN2A
SCHEMBL26426577 0.76 HDAC3 (0.39) ESR1KMT2ASCN1ASCN2ASCN3A
SCHEMBL26426590 0.76 SCN1A (0.44) ESR1KMT2AALDH1A1SCN1ASCN2A
SCHEMBL21705752 0.76 SCN1A (0.44) ESR1KMT2AALDH1A1SCN1ASCN2A
SCHEMBL26809593 0.75 HDAC3 (0.39) ESR1KMT2AALDH1A1SCN1ASCN2A
SCHEMBL13655561 0.74 HDAC3 (0.39) ESR1KMT2AALDH1A1HDAC3HDAC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed