SCHEMBL26426577

SCHEMBL26426577

O=C(OCCN(CCOC(=O)c1cc(I)cc(I)c1I)CCOC(=O)c1cc(I)cc(I)c1I)c1cc(I)cc(I)c1I

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC3 O15379 1/20 0.39
HDAC4 P56524 1/20 0.39
HDAC1 Q13547 1/20 0.39
HDAC7 Q8WUI4 1/20 0.39
HDAC2 Q92769 1/20 0.39
HDAC10 Q969S8 1/20 0.39
HDAC11 Q96DB2 1/20 0.39
HDAC8 Q9BY41 1/20 0.39
HDAC6 Q9UBN7 1/20 0.39
HDAC9 Q9UKV0 1/20 0.39
HDAC5 Q9UQL6 1/20 0.39
HTR3A P46098 3/20 0.39
MAOA P21397 2/20 0.39
HRH3 Q9Y5N1 2/20 0.39
CHRM2 P08172 2/20 0.39
CHRM3 P20309 2/20 0.39
HTR2C P28335 1/20 0.39
CHRNA4 P43681 1/20 0.39
KCNH2 Q12809 1/20 0.39
SCN1A P35498 4/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426576 0.91 HTR3A (0.47) HTR3AMAOAHRH3CHRM2CHRM3
SCHEMBL21783823 0.91 HTR3A (0.50) HTR3AMAOAHRH3CHRM2CHRM3
SCHEMBL26426605 0.90 HDAC3 (0.39) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL26426590 0.90 SCN1A (0.44) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL21705752 0.90 SCN1A (0.44) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL26809593 0.89 HDAC3 (0.39) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL26426596 0.88 ESR1 (0.45) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL26426606 0.88 ESR1 (0.45) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL26426574 0.88 HDAC3 (0.38) HDAC3HDAC4HDAC1HDAC7HDAC2
SCHEMBL26426579 0.86 ESR1 (0.42) HTR3AMAOAHRH3CHRM2CHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed