SCHEMBL21783791

SCHEMBL21783791

O=C1CC(C(=O)O)CC(C(=O)OOC(=O)C2COCC(C(=O)O)C2)C1

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ABAT P80404 1/20 0.34
OAT P04181 1/20 0.32
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2079668 0.78 ABAT (0.48) ABATOATMAPT
SCHEMBL2083101 0.78 ABAT (0.48) ABATOATMAPT
SCHEMBL1872031 0.75 CYP2C19 (0.39) ABAT
SCHEMBL1650296 0.75 BRD4 (0.44) ABATOATMAPT
SCHEMBL3465342 0.69 MAPT (0.33) MAPT
SCHEMBL301495 0.69
SCHEMBL28490005 0.66
SCHEMBL2670790 0.66 BRD4 (0.50)
SCHEMBL1650294 0.66 BRD4 (0.50)
SCHEMBL19583136 0.66 GABRR1 (0.42) ABATOAT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed