SCHEMBL21789026

SCHEMBL21789026

OC12CC3C4C5C6CC(O)(CC6(O)C4(O)C1)CC5(O)C3(O)C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21789024 0.87
SCHEMBL21789025 0.84
SCHEMBL21789023 0.69
SCHEMBL424435 0.59 PKM (0.42)
SCHEMBL13715152 0.54
SCHEMBL23096814 0.53 PKM (0.37)
SCHEMBL16181727 0.53 PKM (0.37)
SCHEMBL18171377 0.52
SCHEMBL3843526 0.51 PKM (0.36)
SCHEMBL12161132 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200071566-A1 SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING KCTECH CO., LTD. (KR) 2020-03-05 US disclosed