SCHEMBL21799595

SCHEMBL21799595

CC(C)C(C)NCc1ccccc1CN

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PNMT P11086 2/20 0.38
LMNA P02545 1/20 0.37
POLB P06746 1/20 0.36
MAPK1 P28482 1/20 0.36
DPP4 P27487 2/20 0.35
BCHE P06276 1/20 0.35
ACHE P22303 1/20 0.35
TAAR1 Q96RJ0 2/20 0.34
ATM Q13315 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.34
PIM1 P11309 1/20 0.34
MEN1 O00255 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34
CYP2D6 P10635 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
KMT2A Q03164 1/20 0.34
KDM4E B2RXH2 1/20 0.33
SIGMAR1 Q99720 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21800071 0.84 BCHE (0.47) PNMTLMNAPOLBMAPK1DPP4
SCHEMBL21799495 0.84 PNMT (0.34) PNMTLMNAPOLBMAPK1DPP4
SCHEMBL21799664 0.81 PNMT (0.35) PNMTLMNAPOLBMAPK1DPP4
SCHEMBL21799792 0.80 PNMT (0.34) PNMTLMNAPOLBMAPK1DPP4
SCHEMBL21799557 0.79 LMNA (0.42) PNMTLMNAPOLBMAPK1DPP4
SCHEMBL25377514 0.78 KDM4E (0.50) LMNATAAR1MEN1KMT2AKDM4E
SCHEMBL25377509 0.78 KDM4E (0.50) LMNATAAR1MEN1KMT2AKDM4E
SCHEMBL25377507 0.78 KDM4E (0.50) LMNATAAR1MEN1KMT2AKDM4E
SCHEMBL21800067 0.78 LMNA (0.45) PNMTLMNAPOLBMAPK1DPP4
SCHEMBL21799869 0.78 MEN1 (0.38) PNMTDPP4TAAR1PIM1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11124593-B2 Modified block copolymer, method for producing modified block copolymer, and resin composition ASAHI KASEI KABUSHIKI KAISHA (JP) 2021-09-21 US disclosed
US-20200199282-A1 Modified Block Copolymer, Method for Producing Modified Block Copolymer, and Resin Composition ASAHI KASEI KABUSHIKI KAISHA (JP) 2020-06-25 US disclosed
EP-3623398-A1 MODIFIED BLOCK COPOLYMER, METHOD FOR PRODUCING MODIFIED BLOCK COPOLYMER, AND RESIN COMPOSITION Asahi Kasei Kabushiki Kaisha (JP) 2020-03-18 EP disclosed