Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 5/20 | 0.46 |
| ▸ | CA2 | P00918 | 5/20 | 0.46 |
| ▸ | CA9 | Q16790 | 4/20 | 0.46 |
| ▸ | BACE1 | P56817 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 4/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.42 |
| ▸ | POLB | P06746 | 2/20 | 0.42 |
| ▸ | ALPL | P05186 | 1/20 | 0.42 |
| ▸ | ALPI | P09923 | 1/20 | 0.42 |
| ▸ | ALPG | P10696 | 1/20 | 0.42 |
| ▸ | EIF4H | Q15056 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 4/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.40 |
| ▸ | MAP1LC3B | Q9GZQ8 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21802286 | 1.00 | CA12 (0.46) | CA12CA2CA9BACE1MEN1 | |
| SCHEMBL22111171 | 0.83 | CA12 (0.50) | CA12CA2CA9BACE1MEN1 | |
| SCHEMBL6833864 | 0.82 | CA12 (0.59) | CA12CA2CA9BACE1MEN1 | |
| SCHEMBL6882412 | 0.82 | CA12 (0.59) | CA12CA2CA9BACE1MEN1 | |
| SCHEMBL22478588 | 0.81 | CA12 (0.72) | CA12CA2CA9MEN1KMT2A | |
| SCHEMBL5728715 | 0.81 | BACE1 (0.50) | CA12CA2CA9BACE1MEN1 | |
| SCHEMBL8756646 | 0.80 | CA12 (0.54) | CA12CA2CA9BACE1MEN1 | |
| SCHEMBL8756643 | 0.80 | CA12 (0.54) | CA12CA2CA9BACE1MEN1 | |
| SCHEMBL22111172 | 0.79 | KMT2A (0.58) | CA12CA2CA9BACE1MEN1 | |
| SCHEMBL5391283 | 0.77 | BACE1 (0.52) | CA12CA2CA9BACE1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11787894-B2 | Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method | KURARAY CO., LTD. (JP) | 2023-10-17 | — | — | US | claimed |
| US-20210087325-A1 | POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD | KURARAY CO., LTD. (JP) | 2021-03-25 | — | — | US | claimed |
| US-20200190247-A1 | POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD | KURRAY CO., LTD. (JP) | 2020-06-18 | — | — | US | claimed |
| EP-3623402-A1 | CHAIN EXTENDER, POLYURETHANE AND MODIFICATION METHOD THEREFOR, POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD | Kuraray Co., Ltd. (JP) | 2020-03-18 | — | — | EP | claimed |
| US-11787894-B2 | Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method | KURARAY CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| US-11787894-B2 | Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method | KURARAY CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| US-11787894-B2 | Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method | KURARAY CO., LTD. (JP) | 2023-10-17 | — | — | US | disclosed |
| US-11053339-B2 | Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method | KURARAY CO., LTD. (JP) | 2021-07-06 | — | — | US | disclosed |
| US-11053339-B2 | Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method | KURARAY CO., LTD. (JP) | 2021-07-06 | — | — | US | disclosed |
| US-20210087325-A1 | POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD | KURARAY CO., LTD. (JP) | 2021-03-25 | — | — | US | disclosed |
| US-20210087325-A1 | POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD | KURARAY CO., LTD. (JP) | 2021-03-25 | — | — | US | disclosed |
| US-20200190247-A1 | POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD | KURRAY CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20200190247-A1 | POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD | KURRAY CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| EP-3623402-A1 | CHAIN EXTENDER, POLYURETHANE AND MODIFICATION METHOD THEREFOR, POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD | Kuraray Co., Ltd. (JP) | 2020-03-18 | — | — | EP | disclosed |