SCHEMBL22111172

SCHEMBL22111172

CCC/N=C/c1ccc(O)cc1O

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.58
ALDH1A1 P00352 2/20 0.58
BACE1 P56817 2/20 0.51
MEN1 O00255 4/20 0.47
POLB P06746 2/20 0.47
ALPL P05186 1/20 0.47
ALPI P09923 1/20 0.47
ALPG P10696 1/20 0.47
EIF4H Q15056 1/20 0.47
L3MBTL1 Q9Y468 1/20 0.47
CA12 O43570 4/20 0.47
CA2 P00918 4/20 0.47
KDM4E B2RXH2 3/20 0.47
AMY1A P0DUB6 1/20 0.46
MAPT P10636 4/20 0.45
GAA P10253 2/20 0.45
NPC1 O15118 1/20 0.45
CA9 Q16790 3/20 0.44
TYR P14679 1/20 0.44
TSHR P16473 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22111171 0.90 CA12 (0.50) KMT2AALDH1A1BACE1MEN1POLB
SCHEMBL6833864 0.89 CA12 (0.59) KMT2AALDH1A1BACE1MEN1POLB
SCHEMBL6882412 0.89 CA12 (0.59) KMT2AALDH1A1BACE1MEN1POLB
SCHEMBL8756643 0.87 CA12 (0.54) KMT2AALDH1A1BACE1MEN1POLB
SCHEMBL8756646 0.87 CA12 (0.54) KMT2AALDH1A1BACE1MEN1POLB
SCHEMBL5391283 0.84 BACE1 (0.52) KMT2AALDH1A1BACE1MEN1POLB
SCHEMBL5710786 0.84 BACE1 (0.52) KMT2AALDH1A1BACE1MEN1POLB
SCHEMBL27558821 0.82 BACE1 (0.51) KMT2AALDH1A1BACE1MEN1POLB
SCHEMBL5728715 0.81 BACE1 (0.50) KMT2AALDH1A1BACE1MEN1POLB
SCHEMBL6811490 0.80 ALDH1A1 (0.62) KMT2AALDH1A1MEN1L3MBTL1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11787894-B2 Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method KURARAY CO., LTD. (JP) 2023-10-17 US disclosed
US-11787894-B2 Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method KURARAY CO., LTD. (JP) 2023-10-17 US disclosed
US-11053339-B2 Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method KURARAY CO., LTD. (JP) 2021-07-06 US disclosed
US-20210087325-A1 POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD KURARAY CO., LTD. (JP) 2021-03-25 US disclosed
US-20200190247-A1 POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD KURRAY CO., LTD. (JP) 2020-06-18 US disclosed