SCHEMBL22111171

SCHEMBL22111171

CCCC/N=C/c1ccc(O)cc1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 5/20 0.50
CA2 P00918 5/20 0.50
CA9 Q16790 4/20 0.50
TYR P14679 2/20 0.50
BACE1 P56817 2/20 0.49
KMT2A Q03164 5/20 0.47
MEN1 O00255 4/20 0.47
MAPT P10636 4/20 0.47
TSHR P16473 2/20 0.47
HTT P42858 2/20 0.47
TDP1 Q9NUW8 2/20 0.47
TP53 P04637 1/20 0.47
CYP3A4 P08684 1/20 0.47
ALOX5 P09917 1/20 0.47
ALOX15 P16050 1/20 0.47
ALDH1A1 P00352 2/20 0.46
ALPL P05186 1/20 0.45
POLB P06746 1/20 0.45
ALPI P09923 1/20 0.45
ALPG P10696 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8756646 0.94 CA12 (0.54) CA12CA2CA9TYRBACE1
SCHEMBL8756643 0.94 CA12 (0.54) CA12CA2CA9TYRBACE1
SCHEMBL22111172 0.90 KMT2A (0.58) CA12CA2CA9TYRBACE1
SCHEMBL6833864 0.86 CA12 (0.59) CA12CA2CA9TYRBACE1
SCHEMBL6882412 0.86 CA12 (0.59) CA12CA2CA9TYRBACE1
SCHEMBL17660180 0.84 CA2 (0.48) CA12CA2CA9TYRKMT2A
SCHEMBL21802286 0.83 CA12 (0.46) CA12CA2CA9BACE1KMT2A
SCHEMBL21802285 0.83 CA12 (0.46) CA12CA2CA9BACE1KMT2A
SCHEMBL17660179 0.82 CA2 (0.47) CA12CA2CA9TYRKMT2A
SCHEMBL5391283 0.81 BACE1 (0.52) CA12CA2CA9BACE1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11787894-B2 Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method KURARAY CO., LTD. (JP) 2023-10-17 US disclosed
US-11787894-B2 Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method KURARAY CO., LTD. (JP) 2023-10-17 US disclosed
US-11053339-B2 Polyurethane for polishing layer, polishing layer including polyurethane and modification method of the polishing layer, polishing pad, and polishing method KURARAY CO., LTD. (JP) 2021-07-06 US disclosed
US-20210087325-A1 POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD KURARAY CO., LTD. (JP) 2021-03-25 US disclosed
US-20200190247-A1 POLYURETHANE FOR POLISHING LAYER, POLISHING LAYER INCLUDING POLYURETHANE AND MODIFICATION METHOD OF THE POLISHING LAYER, POLISHING PAD, AND POLISHING METHOD KURRAY CO., LTD. (JP) 2020-06-18 US disclosed