SCHEMBL218740

SCHEMBL218740

O=c1c2ccccc2oc2ccc(Cl)cc12

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOA P21397 4/20 0.67
KDM4E B2RXH2 1/20 0.67
ALDH1A1 P00352 1/20 0.67
GLA P06280 1/20 0.67
CYP3A4 P08684 1/20 0.67
MAPT P10636 1/20 0.67
HPGD P15428 1/20 0.67
PGAM1 P18669 1/20 0.67
CASP1 P29466 1/20 0.67
CASP7 P55210 1/20 0.67
SMN1; SMN2 Q16637 1/20 0.67
HSD17B10 Q99714 1/20 0.67
AHR P35869 3/20 0.61
TTR P02766 3/20 0.61
ADORA3 P0DMS8 2/20 0.59
NPC1 O15118 3/20 0.57
RAB9A P51151 2/20 0.57
POLB P06746 1/20 0.57
L3MBTL1 Q9Y468 1/20 0.57
CA1 P00915 2/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11594586 1.00 MAOA (0.67) MAOAKDM4EALDH1A1GLACYP3A4
SCHEMBL4696452 0.96 AHR (0.61) MAOAKDM4EALDH1A1GLACYP3A4
SCHEMBL4092241 0.90 TTR (0.71) KDM4EALDH1A1MAPTHPGDSMN1; SMN2
SCHEMBL237891 0.89 AHR (0.79) MAOAKDM4EALDH1A1GLACYP3A4
SCHEMBL25625936 0.86 MAOA (0.58) MAOAKDM4EALDH1A1GLACYP3A4
SCHEMBL24398708 0.85 AHR (0.72) MAOAKDM4EALDH1A1GLACYP3A4
SCHEMBL20346623 0.85 AHR (0.53) MAOAKDM4EALDH1A1GLACYP3A4
SCHEMBL25625966 0.85 CASP3 (0.60) MAOAKDM4EALDH1A1GLACYP3A4
SCHEMBL20317231 0.84 TTR (0.56) MAOAKDM4EALDH1A1GLACYP3A4
SCHEMBL2281402 0.84 AHR (0.77) MAOAKDM4EALDH1A1GLACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 143 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1373980-B1 HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM NAPP SYSTEMS INC (US) 2012-05-09 EP claimed
EP-1373980-A4 HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM NAPP SYSTEMS INC (US) 2007-12-05 EP claimed
EP-1373980-A1 HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM Napp Systems, Inc. (US) 2004-01-02 EP claimed
US-20030175622-A1 High performance, photoimageable resin compositions and printing plates prepared therefrom NAPP SYSTEMS, INC. 2003-09-18 US claimed
US-6579664-B2 A high performance, photoimageable resin consists of a copolymer of conjugated aliphatic diene, alpha-beta unsaturated carboxylic acid, sulfonic acid, phosphoric acid, amine and ammonium chloride; a polyfunctional acrylate NAPP SYSTEMS, INC. 2003-06-17 US claimed
US-20020172875-A1 High performance, photoimageable resin compositions and printing plates prepared therefrom CITIBANK, N.A. 2002-11-21 US claimed
WO-2002079879-A1 HIGH PERFORMANCE, PHOTOIMAGEABLE RESIN COMPOSITIONS AND PRINTING PLATES PREPARED THEREFROM NAPP SYSTEMS, INC. (US) 2002-10-10 WO claimed
US-5976763-A COPOLYMER CONTAINING CONJUGATED DIENE, UNSATURATED CARBOXYLIC ACID AND OTHE RUNSATURATED COMPOUNDS NAPP SYSTEMS, INC. 1999-11-02 US claimed
US-5736298-A COMPRISES A PARTICULATE POLYMER OF A CARBOXY-GROUP-CONTAINING-DIENE HAVING A CROSSLINKED STRUCTURE JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-04-07 US claimed
EP-0607962-B1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-07-17 EP claimed
US-5371116-A Long self life SHIN-ETSU CHEMICAL CO., LTD. (JP) 1994-12-06 US claimed
EP-0607962-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-07-27 EP claimed
US-5069999-A PRESENSITIZED FUJI PHOTO FILM CO., LTD. (JP) 1991-12-03 US claimed
US-4703338-A Resin composition to seal electronic device DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1987-10-27 US claimed
US-4548892-A INITIATOR FOR ADDITION POLYMERS FUJI PHOTO FILM CO., LTD. (JP) 1985-10-22 US claimed
WO-2025057864-A1 ORGANIC EL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING SAME TOPPANホールディングス株式会社 2025-03-20 WO disclosed
EP-4269406-B1 COMPOUND FOR ORGANIC ELECTRICAL ELEMENT, ORGANIC ELECTRICAL ELEMENT USING SAME AND ELECTRONIC DEVICE THEREOF DUK SAN NEOLUX CO LTD (KR) 2024-07-10 EP disclosed
EP-0005379-B1 PHOTOSENSITIVE COMPOSITIONS CONTAINING CARBONYLIC HALIDES AS ACTIVATORS Dynachem Corporation (US) 1981-12-23 EP disclosed
EP-0005379-A2 Photosensitive compositions containing carbonylic halides as activators Dynachem Corporation (US) 1979-11-14 EP disclosed
US-4086350-A FLUORO, CHLORO AND CYANO SUBSTITUTED 4-(9-XANTHENYLIDENE, 9-THIOXANTHENYLIDENE OR 11(6H)-DIBENZO(B,E)OXEPINYLIDENE)-1-METHYL-PIPERIDINES SMITHKLINE CORPORATION (US) 1978-04-25 US disclosed