⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20292687 | 0.78 | — | — | |
| SCHEMBL20292693 | 0.74 | — | — | |
| SCHEMBL2058760 | 0.69 | CA5A (0.46) | — | |
| SCHEMBL1904 | 0.69 | — | — | |
| SCHEMBL126970 | 0.69 | — | — | |
| SCHEMBL2186251 | 0.69 | — | — | |
| Methyl Alcohol SCHEMBL23421569 | 0.66 | — | — | |
| SCHEMBL22581624 | 0.66 | — | — | |
| Bromide SCHEMBL11364017 | 0.66 | — | — | |
| SCHEMBL20583855 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2031031-B1 | Use of a latent acid for improving adhesion | SIKA TECHNOLOGY AG (CH) | 2011-07-13 | — | — | EP | claimed |
| EP-2031031-A1 | Use of a latent acid for improving adhesion | Sika Technology AG (CH) | 2009-03-04 | — | — | EP | claimed |
| CN-109428110-B | Rechargeable lithium battery | 三星SDI株式会社 | 2022-04-29 | — | — | CN | disclosed |
| CN-111095656-A | Lithium secondary battery | 三星SDI株式会社 | 2020-05-01 | — | — | CN | disclosed |
| CN-109428110-A | Lithium rechargeable battery | 三星SDI株式会社 | 2019-03-05 | — | — | CN | disclosed |
| EP-2928296-A1 | USE OF SUBSTITUTED 1-(ARYL ETHYNYL)-, 1-(HETEROARYL ETHYNYL)-, 1-(HETEROCYCLYL ETHYNYL)- AND 1-(CYLOALKENYL ETHYNYL)-CYCLOHEXANOLS AS ACTIVE AGENTS AGAINST ABIOTIC PLANT STRESS | Bayer CropScience AG (DE) | 2015-10-14 | — | — | EP | disclosed |
| EP-2928297-A1 | USE OF SUBSTITUTED 1-(ARYL ETHYNYL)-, 1-(HETEROARYL ETHYNYL)-, 1-(HETEROCYCLYL ETHYNYL)- AND 1-(CYLOALKENYL ETHYNYL)-BICYCLOALKANOLS AS ACTIVE AGENTS AGAINST ABIOTIC PLANT STRESS | Bayer CropScience AG (DE) | 2015-10-14 | — | — | EP | disclosed |
| CN-104955327-A | Use of substituted 1-(aryl ethynyl)-, 1-(heteroaryl ethynyl)-, 1-(heterocyclyl ethynyl)-and 1-(cyloalkenyl ethynyl)-bicycloalkanols as active agents against abiotic plant stress | BAYER CROPSCIENCE AG | 2015-09-30 | — | — | CN | disclosed |
| WO-2014086751-A1 | USE OF SUBSTITUTED 1-(ARYL ETHYNYL)-, 1-(HETEROARYL ETHYNYL)-, 1-(HETEROCYCLYL ETHYNYL)- AND 1-(CYLOALKENYL ETHYNYL)-CYCLOHEXANOLS AS ACTIVE AGENTS AGAINST ABIOTIC PLANT STRESS | BAYER CROPSCIENCE AG (DE) | 2014-06-12 | — | — | WO | disclosed |
| WO-2014086723-A1 | USE OF SUBSTITUTED 1-(ARYL ETHYNYL)-, 1-(HETEROARYL ETHYNYL)-, 1-(HETEROCYCLYL ETHYNYL)- AND 1-(CYLOALKENYL ETHYNYL)-BICYCLOALKANOLS AS ACTIVE AGENTS AGAINST ABIOTIC PLANT STRESS | BAYER CROPSCIENCE AG (DE) | 2014-06-12 | — | — | WO | disclosed |
| EP-2031031-B1 | Use of a latent acid for improving adhesion | SIKA TECHNOLOGY AG (CH) | 2011-07-13 | — | — | EP | disclosed |
| EP-2031031-A1 | Use of a latent acid for improving adhesion | Sika Technology AG (CH) | 2009-03-04 | — | — | EP | disclosed |
| EP-2031031-A1 | Use of a latent acid for improving adhesion | Sika Technology AG (CH) | 2009-03-04 | — | — | EP | disclosed |
| EP-0200141-A2 | Photoresist composition | NIPPON ZEON CO., LTD. (JP) | 1986-11-05 | — | — | EP | disclosed |