SCHEMBL218869

SCHEMBL218869

CCCC(CC)CCCN

nearest known ligand 0.54

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.54
TDP1 Q9NUW8 1/20 0.54
CYP3A4 P08684 3/20 0.50
TSHR P16473 2/20 0.41
DNM1 Q05193 8/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
EPHX1 P07099 1/20 0.39
CA2 P00918 2/20 0.39
OPRM1 P35372 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2874916 0.92 ALDH1A1 (0.52) ALDH1A1TDP1CYP3A4TSHRDNM1
SCHEMBL13678755 0.92 ALDH1A1 (0.55) ALDH1A1TDP1CYP3A4TSHRDNM1
SCHEMBL3622688 0.90 ALDH1A1 (0.50) ALDH1A1TDP1CYP3A4TSHRDNM1
SCHEMBL13969948 0.90 ALDH1A1 (0.50) ALDH1A1TDP1CYP3A4TSHRDNM1
SCHEMBL16401686 0.90 ALDH1A1 (0.50) ALDH1A1TDP1CYP3A4TSHRDNM1
SCHEMBL16596400 0.90 ALDH1A1 (0.68) ALDH1A1TDP1CYP3A4TSHRDNM1
SCHEMBL8320021 0.90 ALDH1A1 (0.68) ALDH1A1TDP1CYP3A4TSHRDNM1
SCHEMBL219201 0.89 ALDH1A1 (0.46) ALDH1A1TDP1CYP3A4TSHRDNM1
SCHEMBL16328588 0.89 ALDH1A1 (0.46) ALDH1A1TDP1CYP3A4TSHRDNM1
SCHEMBL24636671 0.87 ALDH1A1 (0.43) ALDH1A1TDP1CYP3A4TSHRDNM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5731128-A ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY NIPPON PAINT CO., LTD. (JP) 1998-03-24 US claimed
CN-110475748-B Method for producing titanium-containing silicon oxide, method for producing epoxide, and titanium-containing silicon oxide 住友化学株式会社 2022-12-30 CN disclosed
EP-2384457-B1 COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2022-07-06 EP disclosed
EP-3888673-A1 TREATMENT OF MICROBIAL INFECTIONS National University of Ireland Galway (IE) 2021-10-06 EP disclosed
WO-2021178887-A1 METHODS, COMPOUNDS, AND COMPOSITIONS FOR MODIFYING CAR-T CELL ACTIVITY PURDUE RESEARCH FOUNDATION (US) 2021-09-10 WO disclosed
CN-110475748-A The Si oxide of the manufacturing method of the Si oxide of titaniferous, the manufacturing method of epoxides and titaniferous SUMITOMO CHEMICAL CO 2019-11-19 CN disclosed
EP-3461272-B1 POLYCARBONATE COPOLYMERS, ARTICLES FORMED THEREFROM, AND METHODS OF MANUFACTURE SABIC GLOBAL TECHNOLOGIES BV (NL) 2019-11-13 EP disclosed
CN-105793387-B Composition containing a polymeric binder comprising acrylate and/or methacrylate units 默克专利有限公司 2019-04-30 CN disclosed
EP-2517273-B1 COMPOSITIONS COMPRISING ORGANIC SEMICONDUCTING COMPOUNDS MERCK PATENT GMBH (DE) 2019-04-03 EP disclosed
EP-3077475-B1 COMPOSITIONS CONTAINING A POLYMERIC BINDER WHICH COMPRISES ACRYLIC AND/OR METHACRYLIC ACID ESTER UNITS MERCK PATENT GMBH (DE) 2018-07-04 EP disclosed
US-5736298-A COMPRISES A PARTICULATE POLYMER OF A CARBOXY-GROUP-CONTAINING-DIENE HAVING A CROSSLINKED STRUCTURE JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-04-07 US disclosed
US-5731128-A ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY NIPPON PAINT CO., LTD. (JP) 1998-03-24 US disclosed
US-5731129-A Photosensitive resin composition comprising a carboxyl group-containing diene copolymer and a hydrogenated diene block polymer JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-03-24 US disclosed
EP-0745900-A1 Water-developing photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-12-04 EP disclosed
EP-0607962-B1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-07-17 EP disclosed
EP-0718695-A2 Water-developable photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-06-26 EP disclosed
EP-0675412-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-10-04 EP disclosed
EP-0607962-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-07-27 EP disclosed
EP-0206621-B1 PROCESS FOR DISPROPORTIONATING SILANES MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-11-15 EP disclosed
EP-0206621-A1 Process for disproportionating silanes MITSUI TOATSU CHEMICALS, Inc. (JP) 1986-12-30 EP disclosed