SCHEMBL2190401

SCHEMBL2190401

COC(Cc1ccccc1)(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 4/20 0.56
SRC P12931 1/20 0.44
PTPN1 P18031 2/20 0.43
CYP1A2 P05177 2/20 0.42
CYP2C9 P11712 1/20 0.42
CYP2C19 P33261 1/20 0.42
CYP3A4 P08684 1/20 0.40
RECQL P46063 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
HIF1A Q16665 1/20 0.40
KCNN4 O15554 1/20 0.40
MAPK1 P28482 1/20 0.39
TSHR P16473 2/20 0.39
CES2 O00748 2/20 0.39
SLC6A2 P23975 1/20 0.39
SLC6A3 Q01959 1/20 0.39
KMT2A Q03164 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL36097 0.83 CES1 (0.59) CES1SRCCYP2C19HIF1AKCNN4
SCHEMBL10456740 0.83 CES1 (0.59) CES1SRCCYP1A2CYP2C19HIF1A
SCHEMBL312995 0.83 KMT2A (0.45) CES1PTPN1CYP1A2CYP2C9CYP2C19
SCHEMBL23256417 0.82 MAPT (0.46) CES1PTPN1CYP1A2CYP2C9CYP2C19
SCHEMBL2532194 0.81 CES1 (0.42) CES1SRCPTPN1CYP1A2CYP2C9
SCHEMBL135045 0.79 CES1 (0.54) CES1SRCCYP2C19CYP3A4HIF1A
Methoxymethane SCHEMBL11588020 0.79 CES1 (0.53) CES1SRCPTPN1CYP1A2CYP2C9
SCHEMBL11091632 0.78 CES1 (0.53) CES1SRCCYP3A4SMN1; SMN2KCNN4
SCHEMBL28536864 0.78 CES1 (0.51) CES1SRCPTPN1RECQLSMN1; SMN2
SCHEMBL9575143 0.76 CES1 (0.50) CES1SRCHIF1AKCNN4MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240152047-A1 HIGH REFRACTIVE INDEX MATERIALS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-05-09 US disclosed
CN-117866195-A High refractive index material 罗门哈斯电子材料有限责任公司 2024-04-12 CN disclosed
EP-3981806-A1 HIGH REFRACTIVE INDEX MATERIALS Rohm and Haas Electronic Materials LLC (US) 2022-04-13 EP disclosed
CN-114316137-A High refractive index materials 罗门哈斯电子材料有限责任公司 2022-04-12 CN disclosed
CN-105319853-B Imaging on substrates with aqueous alkaline soluble UV blocking compositions and aqueous soluble UV transparent films 罗门哈斯电子材料有限责任公司 2020-06-30 CN disclosed
US-10583459-B2 Imaging three dimensional substrates using a transfer film ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2020-03-10 US disclosed
US-9661754-B2 Imaging on substrates with aqueous alkaline soluble UV blocking compositions and aqueous soluble UV transparent films ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-05-23 US disclosed
US-9622353-B2 Imaging on substrates with alkaline strippable UV blocking compositions and aqueous soluble UV transparent films ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-04-11 US disclosed
US-9611402-B2 Hot melt compositions with improved etch resistance ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) 2017-04-04 US disclosed
US-9598590-B2 Hot melt compositions with improved etch resistance ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-03-21 US disclosed
US-20060049129-A1 Plating process AVECIA LIMITED (GB) 2006-03-09 US disclosed
US-20060047014-A1 Printing process and solder mask ink composition AVECIA INKJET LIMITED (GB) 2006-03-02 US disclosed
US-20060019077-A1 Process AVECIA INKJET LIMITED 2006-01-26 US disclosed
EP-1543703-A1 PLATING PROCESS Avecia Limited (GB) 2005-06-22 EP disclosed
EP-1543083-A1 PROCESS AND INK FOR MAKING ELECTRONIC DEVICES Avecia Limited (GB) 2005-06-22 EP disclosed
EP-1543704-A1 PRINTING PROCESS AND SOLDER MASK INK COMPOSITION Avecia Limited (GB) 2005-06-22 EP disclosed
WO-2004106437-A1 PROCESS AVECIA INKJET LIMITED (GB) 2004-12-09 WO disclosed
WO-2004028224-A1 PLATING PROCESS AVECIA LIMITED (GB) 2004-04-01 WO disclosed
WO-2004028225-A1 PRINTING PROCESS AND SOLDER MASK INK COMPOSITION AVECIA LIMITED (GB) 2004-04-01 WO disclosed
WO-2004026977-A1 PROCESS AND INK FOR MAKING ELECTRONIC DEVICES AVECIA LIMITED (GB) 2004-04-01 WO disclosed