Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.46 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
| ▸ | BLM | P54132 | 1/20 | 0.46 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 3/20 | 0.45 |
| ▸ | CES2 | O00748 | 1/20 | 0.45 |
| ▸ | CES1 | P23141 | 1/20 | 0.45 |
| ▸ | SCN1A | P35498 | 1/20 | 0.43 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.43 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4016018 | 0.94 | LMNA (0.50) | ALDH1A1MAPTTSHRCYP1A2CYP3A4 | |
| SCHEMBL312996 | 0.89 | TSHR (0.43) | ALDH1A1MAPTTSHRCYP1A2CYP3A4 | |
| SCHEMBL2532195 | 0.88 | KDM4E (0.41) | ALDH1A1MAPTTSHRCYP1A2CYP3A4 | |
| SCHEMBL20957613 | 0.87 | TSHR (0.48) | ALDH1A1MAPTTSHRCYP1A2CYP3A4 | |
| Methoxymethane SCHEMBL7628233 | 0.85 | LMNA (0.47) | ALDH1A1TSHRCYP2C9HIF1ALMNA | |
| SCHEMBL28924902 | 0.84 | LMNA (0.44) | ALDH1A1MAPTTSHRCYP1A2CYP3A4 | |
| SCHEMBL28633179 | 0.83 | LMNA (0.42) | ALDH1A1TSHRLMNACES2CES1 | |
| Benzophenone SCHEMBL27831512 | 0.83 | LMNA (0.41) | ALDH1A1MAPTTSHRCYP1A2CYP3A4 | |
| Benzoin SCHEMBL28288426 | 0.81 | LMNA (0.60) | ALDH1A1MAPTCYP3A4TDP1LMNA | |
| Methoxymethane SCHEMBL135046 | 0.81 | LMNA (0.46) | ALDH1A1NPSR1LMNACES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110168030-A | Thermoformable and scratch-resistant photopolymer coating | 上阿尔萨斯大学 | 2019-08-23 | — | — | CN | claimed |
| US-20240152047-A1 | HIGH REFRACTIVE INDEX MATERIALS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-05-09 | — | — | US | disclosed |
| CN-117866195-A | High refractive index material | 罗门哈斯电子材料有限责任公司 | 2024-04-12 | — | — | CN | disclosed |
| EP-3981806-A1 | HIGH REFRACTIVE INDEX MATERIALS | Rohm and Haas Electronic Materials LLC (US) | 2022-04-13 | — | — | EP | disclosed |
| CN-114316137-A | High refractive index materials | 罗门哈斯电子材料有限责任公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-105319853-B | Imaging on substrates with aqueous alkaline soluble UV blocking compositions and aqueous soluble UV transparent films | 罗门哈斯电子材料有限责任公司 | 2020-06-30 | — | — | CN | disclosed |
| US-10583459-B2 | Imaging three dimensional substrates using a transfer film | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-03-10 | — | — | US | disclosed |
| CN-110168030-A | Thermoformable and scratch-resistant photopolymer coating | 上阿尔萨斯大学 | 2019-08-23 | — | — | CN | disclosed |
| US-9661754-B2 | Imaging on substrates with aqueous alkaline soluble UV blocking compositions and aqueous soluble UV transparent films | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-05-23 | — | — | US | disclosed |
| US-9622353-B2 | Imaging on substrates with alkaline strippable UV blocking compositions and aqueous soluble UV transparent films | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-04-11 | — | — | US | disclosed |
| CN-1694934-A | Method and ink for preparing electronic device | AVECIA LTD (GB) | 2005-11-09 | — | — | CN | disclosed |
| CN-1695406-A | Plating process | AVECIA LTD (GB) | 2005-11-09 | — | — | CN | disclosed |
| EP-1543704-A1 | PRINTING PROCESS AND SOLDER MASK INK COMPOSITION | Avecia Limited (GB) | 2005-06-22 | — | — | EP | disclosed |
| EP-1543703-A1 | PLATING PROCESS | Avecia Limited (GB) | 2005-06-22 | — | — | EP | disclosed |
| EP-1543083-A1 | PROCESS AND INK FOR MAKING ELECTRONIC DEVICES | Avecia Limited (GB) | 2005-06-22 | — | — | EP | disclosed |
| WO-2004106437-A1 | PROCESS | AVECIA INKJET LIMITED (GB) | 2004-12-09 | — | — | WO | disclosed |
| WO-2004028224-A1 | PLATING PROCESS | AVECIA LIMITED (GB) | 2004-04-01 | — | — | WO | disclosed |
| WO-2004028225-A1 | PRINTING PROCESS AND SOLDER MASK INK COMPOSITION | AVECIA LIMITED (GB) | 2004-04-01 | — | — | WO | disclosed |
| WO-2004026977-A1 | PROCESS AND INK FOR MAKING ELECTRONIC DEVICES | AVECIA LIMITED (GB) | 2004-04-01 | — | — | WO | disclosed |
| CN-1124912-A | Photosensitive resin composition and method for using the same in manufacture of circuit boards | HITACHI LTD (JP) | 1996-06-19 | — | — | CN | disclosed |