⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28832410 | 0.78 | HDAC1 (0.32) | — | |
| SCHEMBL26842416 | 0.77 | — | — | |
| SCHEMBL18799683 | 0.74 | — | — | |
| SCHEMBL21263627 | 0.70 | HDAC1 (0.35) | — | |
| SCHEMBL5358363 | 0.70 | RAPGEF4 (0.35) | — | |
| SCHEMBL13991460 | 0.70 | HDAC1 (0.31) | — | |
| SCHEMBL5352193 | 0.70 | HDAC1 (0.31) | — | |
| SCHEMBL5357263 | 0.70 | CA1 (0.31) | — | |
| SCHEMBL20251180 | 0.69 | — | — | |
| SCHEMBL5345176 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200133126-A1 | COATING COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR EUV LITHOGRAPHY PROCESS | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2020-04-30 | — | — | US | disclosed |