Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LPL | P06858 | 2/20 | 0.37 |
| ▸ | LIPG | Q9Y5X9 | 2/20 | 0.37 |
| ▸ | ACACB | O00763 | 2/20 | 0.35 |
| ▸ | ACACA | Q13085 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | THRB | P10828 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | MGLL | Q99685 | 1/20 | 0.33 |
| ▸ | PLK1 | P53350 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | HTR2A | P28223 | 1/20 | 0.33 |
| ▸ | CNR1 | P21554 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23034842 | 0.79 | ESR1 (0.31) | — | |
| SCHEMBL13367145 | 0.79 | HRH3 (0.38) | — | |
| SCHEMBL13752316 | 0.79 | PPARG (0.40) | CA2 | |
| SCHEMBL29293451 | 0.79 | ESR1 (0.31) | CA2L3MBTL1 | |
| SCHEMBL14540206 | 0.79 | HRH3 (0.38) | — | |
| SCHEMBL14041126 | 0.77 | — | — | |
| SCHEMBL13808691 | 0.77 | HRH3 (0.48) | — | |
| SCHEMBL19827201 | 0.77 | L3MBTL1 (0.35) | GAAL3MBTL1 | |
| SCHEMBL18965814 | 0.76 | IDO1 (0.39) | ACACB | |
| SCHEMBL24712898 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3079015-B1 | PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK | SHINETSU CHEMICAL CO (JP) | 2020-04-29 | — | — | EP | disclosed |