SCHEMBL21938941

SCHEMBL21938941

Cc1cc(C)cc(CNC(=O)C(CC(C)C)C(C)C)c1

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ ANPEP P15144 2/20 0.42
▸ CARM1 Q86X55 2/20 0.40
▸ PRMT6 Q96LA8 2/20 0.40
▸ ERCC1 P07992 1/20 0.39
▸ ERCC4 Q92889 1/20 0.39
▸ ERAP2 Q6P179 1/20 0.39
▸ ERAP1 Q9NZ08 1/20 0.39
▸ LNPEP Q9UIQ6 1/20 0.39
▸ TAS1R3 Q7RTX0 1/20 0.38
▸ TAS1R1 Q7RTX1 1/20 0.38
▸ HTT P42858 1/20 0.38
▸ NPSR1 Q6W5P4 1/20 0.38
▸ MMP2 P08253 1/20 0.37
▸ MMP8 P22894 1/20 0.37
▸ KMT2A Q03164 2/20 0.37
▸ GAA P10253 1/20 0.37
▸ MEN1 O00255 1/20 0.37
▸ POLB P06746 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20428059 0.80 ERCC1 (0.57) CARM1PRMT6ERCC1ERCC4HTT
SCHEMBL28276130 0.78 CARM1 (0.45) CARM1PRMT6ERCC1ERCC4HTT
SCHEMBL14827285 0.76 LMNA (0.45) CARM1PRMT6ERCC1ERCC4HTT
SCHEMBL23009858 0.73 HTT (0.59) CARM1PRMT6HTTNPSR1KMT2A
SCHEMBL465569 0.73 GAA (0.49) KMT2AGAAMEN1POLB
SCHEMBL25917268 0.73 LMNA (0.61) CARM1PRMT6ERCC1ERCC4HTT
SCHEMBL26078271 0.72 ECE1 (0.38) ANPEPMMP2MMP8
SCHEMBL18251700 0.71 ERCC1 (0.55) CARM1PRMT6ERCC1ERCC4KMT2A
SCHEMBL17117530 0.70 KMT2A (0.50) NPSR1KMT2AGAAMEN1POLB
SCHEMBL4400595 0.70 ECE1 (0.37) ANPEPMMP2MMP8KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230367212-A1 PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-11-16 — — US disclosed
US-11372331-B2 Treatment liquid for manufacturing semiconductor, method of manufacturing treatment liquid for manufacturing semiconductor, pattern forming method, and method of manufacturing electronic device FUJIFILM CORPORATION (JP) 2022-06-28 — — US disclosed
US-10599038-B2 Rinsing liquid, pattern forming method, and electronic device manufacturing method FUJIFILM CORPORATION (JP) 2020-03-24 — — US disclosed
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