SCHEMBL2194744

SCHEMBL2194744

C[Si](C)(COc1ccc(N)cc1)O[Si](C)(C)COc1ccc(N)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 6/20 0.54
TSHR P16473 2/20 0.54
MAPK1 P28482 1/20 0.43
MAPT P10636 4/20 0.42
MAOB P27338 3/20 0.42
RAB9A P51151 3/20 0.42
GAA P10253 2/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
MAOA P21397 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
ALDH1A1 P00352 5/20 0.41
CYP3A4 P08684 2/20 0.41
APP P05067 2/20 0.40
NPC1 O15118 2/20 0.40
KMT2A Q03164 2/20 0.40
MEN1 O00255 1/20 0.39
APAF1 O14727 1/20 0.39
TEAD4 Q15561 1/20 0.39
LTA4H P09960 1/20 0.39
PTGS1 P23219 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11317761 0.84 TDP1 (0.43) TDP1TSHRMAPK1MAPTMAOB
SCHEMBL12660720 0.83 TDP1 (0.58) TDP1TSHRMAPK1MAPTMAOB
SCHEMBL12531353 0.82 NPC1 (0.43) TDP1TSHRMAPTRAB9AGAA
SCHEMBL10938457 0.80 TDP1 (0.50) TDP1TSHRMAPK1MAPTMAOB
SCHEMBL11320968 0.80 TDP1 (0.52) TDP1TSHRMAPK1MAPTMAOB
SCHEMBL11317808 0.79 TDP1 (0.50) TDP1TSHRMAPK1MAPTMAOB
SCHEMBL3699905 0.77 TDP1 (0.49) TDP1TSHRMAPTMAOBRAB9A
SCHEMBL895776 0.77 CYP3A4 (0.59) TSHRMAPTMAOBALDH1A1CYP3A4
SCHEMBL10046725 0.76 NPC1 (0.45) TDP1TSHRMAPTRAB9AGAA
SCHEMBL11316263 0.75 TDP1 (0.48) TDP1TSHRMAPK1MAPTMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8722758-B2 Water soluble polyimide resin, its preparation and use CHANG CHUN PLASTICS CO., LTD. (TW) 2014-05-13 US claimed
US-8084512-B2 Water soluble photosensitive polymide polymer, its preparation and photoresist containing the same CHANG CHUN PLASTICS CO., LTD. (TW) 2011-12-27 US claimed
US-20110172324-A1 NOVEL WATER SOLUBLE POLYIMIDE RESIN, ITS PREPARATION AND USE CHANG CHUN PLASTICS CO., LTD. (TW) 2011-07-14 US claimed
US-20100167208-A1 WATER SOLUBLE PHOTOSENSITIVE POLYMIDE POLYMER, ITS PREPARATION AND PHOTORESIST CONTAINING THE SAME CHANG CHUN PLASTICS CO., LTD. (TW) 2010-07-01 US claimed
US-20160198570-A1 ADHESIVE COMPOSITION FOR PRINTED WIRING BOARDS, BONDING FILM, COVERLAY, COPPER-CLAD LAMINATE AND PRINTED WIRING BOARD SUMITOMO ELECTROC INDUSTRIES, LTD. (JP) 2016-07-07 US disclosed
US-9187600-B2 Polyimides as dielectric BASF SE (DE) 2015-11-17 US disclosed
US-20150029638-A1 POLYIMIDES AS DIELECTRICS BASF SE (DE) 2015-01-29 US disclosed
US-20150029638-A1 POLYIMIDES AS DIELECTRICS BASF SE (DE) 2015-01-29 US disclosed
US-8722758-B2 Water soluble polyimide resin, its preparation and use CHANG CHUN PLASTICS CO., LTD. (TW) 2014-05-13 US disclosed
WO-2013144856-A1 POLYIMIDES AS DIELECTRICS BASF SE (DE) 2013-10-03 WO disclosed
US-20120108740-A1 POLYIMIDES AS DIELECTRIC BASF SE (DE) 2012-05-03 US disclosed
US-8084512-B2 Water soluble photosensitive polymide polymer, its preparation and photoresist containing the same CHANG CHUN PLASTICS CO., LTD. (TW) 2011-12-27 US disclosed
US-20100167208-A1 WATER SOLUBLE PHOTOSENSITIVE POLYMIDE POLYMER, ITS PREPARATION AND PHOTORESIST CONTAINING THE SAME CHANG CHUN PLASTICS CO., LTD. (TW) 2010-07-01 US disclosed
US-20100167208-A1 WATER SOLUBLE PHOTOSENSITIVE POLYMIDE POLYMER, ITS PREPARATION AND PHOTORESIST CONTAINING THE SAME CHANG CHUN PLASTICS CO., LTD. (TW) 2010-07-01 US disclosed
US-20090186295-A1 Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof PI R&D CO., LTD. (JP) 2009-07-23 US disclosed
US-6753048-B2 COMPRISES CURED POLYAMIDE FILM OVER TRANSISTOR; IMPROVED ELECTRICAL PROPERTIES (VOLTAGE HOLDING RATIO, PRE-TILT ANGLES, RESIDUAL DIRECT CURRENT VOLTAGE, ADHERENCE TO SUBSTRATES, AND PRINTABILITY) HITACHI, LTD. (JP) 2004-06-22 US disclosed
US-6720040-B2 RUBBING LIQUID CRYSTALLINE POLYMER HITACHI, LTD. (JP) 2004-04-13 US disclosed
US-20030108686-A1 Material for liquid-crystal alignment film, liquid-crystal display element, process for its production and liquid-crystal display unit KATSUMURA NOBUHITO (JP) 2003-06-12 US disclosed
US-20030021914-A1 Material for liquid-crystal alignment film, liquid-crystal display element, process for its production and liquid-crystal display unit HITACHI, LTD. (JP) 2003-01-30 US disclosed
EP-1276003-A1 Liquid-crystal display Hitachi, Ltd. (JP) 2003-01-15 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110172324-A1 NOVEL WATER SOLUBLE POLYIMIDE RESIN, ITS PREPARATION AND USE ARID2, PUF60, PADI4 TDP1 1385/4885TSHR 3971/4885MAPK1 2095/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.