Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 9/20 | 0.38 |
| ▸ | MAPT | P10636 | 5/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.38 |
| ▸ | MEN1 | O00255 | 3/20 | 0.38 |
| ▸ | PKM | P14618 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.38 |
| ▸ | MITF | O75030 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | CCR6 | P51684 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.38 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.38 |
| ▸ | NQO1 | P15559 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.33 |
| ▸ | HPGD | P15428 | 3/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2201698 | 0.83 | ALDH1A1 (0.42) | ALDH1A1MAPTKMT2ACYP1A2MEN1 | |
| SCHEMBL29368544 | 0.78 | ALDH1A1 (0.40) | ALDH1A1MAPTKMT2ACYP1A2MEN1 | |
| SCHEMBL5068229 | 0.78 | ALDH1A1 (0.40) | ALDH1A1MAPTKMT2ACYP1A2MEN1 | |
| SCHEMBL8741142 | 0.77 | GPBAR1 (0.41) | ALDH1A1MAPTKMT2ACYP1A2MEN1 | |
| SCHEMBL9234416 | 0.76 | ALDH1A1 (0.39) | ALDH1A1MAPTKMT2ACYP1A2MEN1 | |
| SCHEMBL29891468 | 0.75 | ALDH1A1 (0.54) | ALDH1A1MAPTKMT2ACYP1A2MEN1 | |
| Anthracene SCHEMBL28971423 | 0.75 | ALDH1A1 (0.54) | ALDH1A1MAPTKMT2ACYP1A2MEN1 | |
| SCHEMBL27113 | 0.75 | ALDH1A1 (0.54) | ALDH1A1MAPTKMT2ACYP1A2MEN1 | |
| SCHEMBL2354149 | 0.74 | ESR1 (0.45) | ALDH1A1MAPTKMT2ACYP1A2MEN1 | |
| SCHEMBL1167375 | 0.73 | ALDH1A1 (0.53) | ALDH1A1MAPTKMT2ACYP1A2MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115210219-A | Oxime ester photoinitiators | 巴斯夫欧洲公司 | 2022-10-18 | — | — | CN | disclosed |
| CN-107315318-B | Photosensitive composition | 东京应化工业株式会社 | 2022-07-01 | — | — | CN | disclosed |
| CN-113316744-A | Oxime ester photoinitiators with specific aroyl chromophores | 巴斯夫欧洲公司 | 2021-08-27 | — | — | CN | disclosed |
| US-7976914-B2 | Resin film, production method thereof, polarizing plate and liquid crystal display device | FUJIFILM CORPORATON (JP) | 2011-07-12 | — | — | US | disclosed |
| US-20070290168-A1 | Resin film, production method thereof, polarizing plate and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2007-12-20 | — | — | US | disclosed |
| US-20070148585-A1 | Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer | LION CORPORATION. | 2007-06-28 | — | — | US | disclosed |
| EP-1698645-A1 | HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER | Lion Corporation (JP) | 2006-09-06 | — | — | EP | disclosed |
| EP-1692094-A2 | BOTTOM ANTIREFLECTIVE COATINGS | AZ Electronic Materials USA Corp. (US) | 2006-08-23 | — | — | EP | disclosed |
| US-7030201-B2 | Bottom antireflective coatings | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-04-18 | — | — | US | disclosed |
| WO-2005052016-A2 | BOTTOM ANTIREFLECTIVE COATINGS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2005-06-09 | — | — | WO | disclosed |
| US-20020015909-A1 | BOTTOM ANTI-REFLECTIVE COATING MATERIAL COMPOSITION FOR PHOTORESIST AND METHOD OF FORMING RESIST PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2002-02-07 | — | — | US | disclosed |
| EP-0851300-B1 | Bottom anti-reflective coating material composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO LTD (JP) | 2001-10-24 | — | — | EP | disclosed |
| EP-0823661-B1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO LTD (JP) | 2001-07-04 | — | — | EP | disclosed |
| US-6248500-B1 | ACRYLIC POLYMERS AND PHENOL, NAPHTHOL OR HYDROXYANTHRACENE COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 2001-06-19 | — | — | US | disclosed |
| US-6165684-A | Bottom anti-reflective coating material composition and method for forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-12-26 | — | — | US | disclosed |
| US-6090531-A | UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-07-18 | — | — | US | disclosed |
| EP-0989463-A2 | Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern | FUJI PHOTO FILM CO., LTD. (JP) | 2000-03-29 | — | — | EP | disclosed |
| EP-0851300-A1 | Bottom anti-reflective coating material composition and method of forming resist pattern using the same | FUJI PHOTO FILM CO., LTD. (JP) | 1998-07-01 | — | — | EP | disclosed |
| EP-0823661-A1 | Composition for anti-reflective coating material | FUJI PHOTO FILM CO., LTD. (JP) | 1998-02-11 | — | — | EP | disclosed |
| US-4123275-A | A VINYL ESTER WITH A HYDROXYALKYL ACRYLATE OR METHACRYLATE, ACRYLAMIDES, METHACRYLAMIDES OR A VINYL HETEROCYCLE | FUJI PHOTO FILM CO., LTD. (JP) | 1978-10-31 | — | — | US | disclosed |