SCHEMBL2201698

SCHEMBL2201698

C=Cc1ccc2ccccc2c1Oc1c(C=C)ccc2ccccc12

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.42
HSD17B10 Q99714 2/20 0.42
CYP2A6 P11509 2/20 0.42
TSHR P16473 2/20 0.42
TDP1 Q9NUW8 1/20 0.42
HPRT1 P00492 1/20 0.39
CYP3A4 P08684 1/20 0.38
HIF1A Q16665 1/20 0.37
CYP1B1 Q16678 1/20 0.37
MAPT P10636 3/20 0.34
KDM4E B2RXH2 2/20 0.34
KMT2A Q03164 2/20 0.34
GLA P06280 1/20 0.34
PTPN22 Q9Y2R2 1/20 0.33
NPC1 O15118 1/20 0.33
LMNA P02545 1/20 0.33
RECQL P46063 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
CYP1A2 P05177 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3698426 0.85 POLB (0.46) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL2199047 0.83 ALDH1A1 (0.38) ALDH1A1HSD17B10CYP2A6TDP1CYP3A4
SCHEMBL8025823 0.82 TDP1 (0.37) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL8490846 0.80 CYP3A4 (0.37) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL8516834 0.80 HPGD (0.48) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL16908453 0.80 ALDH1A1 (0.35) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL9310776 0.80 SLC2A1 (0.43) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL16908455 0.80 PAX8 (0.36) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL16309563 0.80 MAPT (0.46) ALDH1A1HSD17B10CYP2A6TSHRTDP1
SCHEMBL29052130 0.80 ERN1 (0.47) ALDH1A1HSD17B10CYP2A6TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115210219-A Oxime ester photoinitiators 巴斯夫欧洲公司 2022-10-18 CN disclosed
CN-107315318-B Photosensitive composition 东京应化工业株式会社 2022-07-01 CN disclosed
CN-113316744-A Oxime ester photoinitiators with specific aroyl chromophores 巴斯夫欧洲公司 2021-08-27 CN disclosed
US-7976914-B2 Resin film, production method thereof, polarizing plate and liquid crystal display device FUJIFILM CORPORATON (JP) 2011-07-12 US disclosed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US disclosed
US-20070290168-A1 Resin film, production method thereof, polarizing plate and liquid crystal display device FUJIFILM CORPORATION (JP) 2007-12-20 US disclosed
US-20070148585-A1 Hyperbranched polymer, production method therefor and resist composition containing hyperbranched polymer LION CORPORATION. 2007-06-28 US disclosed
EP-1698645-A1 HYPERBRANCHED POLYMER, PROCESS FOR PRODUCING THE SAME AND RESIST COMPOSITION CONTAINING THE HYPERBRANCHED POLYMER Lion Corporation (JP) 2006-09-06 EP disclosed
EP-1692094-A2 BOTTOM ANTIREFLECTIVE COATINGS AZ Electronic Materials USA Corp. (US) 2006-08-23 EP disclosed
WO-2005052016-A2 BOTTOM ANTIREFLECTIVE COATINGS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2005-06-09 WO disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed
EP-0729989-A2 Polymers containing macromonomer mixtures UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1996-09-04 EP disclosed
EP-0642540-A1 COMPLEX HYDROPHOBE COMPOUNDS, MACROMONOMERS AND MACROMONOMER-CONTAINING POLYMERS. UNION CARBIDE CHEM PLASTIC (US) 1995-03-15 EP disclosed
WO-1993024544-A1 COMPLEX HYDROPHOBE COMPOUNDS, MACROMONOMERS AND MACROMONOMER-CONTAINING POLYMERS UNION CARBIDE CHEMICALS & PLASTICS TECHNOLOGY CORPORATION (US) 1993-12-09 WO disclosed
EP-0033081-B1 ANIONIC COPOLYMERS CONTAINING POLYVALENT METAL CATIONS AND THEIR USE IN PHOTOGRAPHIC MATERIALS Agfa-Gevaert AG (DE) 1985-04-24 EP disclosed
EP-0048412-B1 PHOTOGRAPHIC MATERIAL WITH A TEMPORARY BARRIER LAYER Agfa-Gevaert AG (DE) 1984-06-20 EP disclosed
EP-0048412-A1 Photographic material with a temporary barrier layer Agfa-Gevaert AG (DE) 1982-03-31 EP disclosed
EP-0033081-A1 Anionic copolymers containing polyvalent metal cations and their use in photographic materials Agfa-Gevaert AG (DE) 1981-08-05 EP disclosed
US-4123275-A A VINYL ESTER WITH A HYDROXYALKYL ACRYLATE OR METHACRYLATE, ACRYLAMIDES, METHACRYLAMIDES OR A VINYL HETEROCYCLE FUJI PHOTO FILM CO., LTD. (JP) 1978-10-31 US disclosed
US-3949136-A OIL REPELLENTS, WATERPROOFING TEXTILES CIBA-GEIGY AG (CH) 1976-04-06 US disclosed