Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR3 | P46089 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 9/20 | 0.33 |
| ▸ | CA2 | P00918 | 9/20 | 0.33 |
| ▸ | CA9 | Q16790 | 3/20 | 0.33 |
| ▸ | CA12 | O43570 | 2/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.33 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.33 |
| ▸ | CDK1 | P06493 | 1/20 | 0.33 |
| ▸ | CCNB1 | P14635 | 1/20 | 0.33 |
| ▸ | CCNA2 | P20248 | 1/20 | 0.33 |
| ▸ | CDK2 | P24941 | 1/20 | 0.33 |
| ▸ | CDK7 | P50613 | 1/20 | 0.33 |
| ▸ | CCNH | P51946 | 1/20 | 0.33 |
| ▸ | CCNA1 | P78396 | 1/20 | 0.33 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | MMP1 | P03956 | 3/20 | 0.32 |
| ▸ | MMP2 | P08253 | 3/20 | 0.32 |
| ▸ | MMP9 | P14780 | 3/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3129912 | 1.00 | GPR3 (0.35) | GPR3CA1CA2CA9CA12 | |
| SCHEMBL3132822 | 0.99 | CA1 (0.35) | GPR3CA1CA2CA9CA12 | |
| SCHEMBL546898 | 0.99 | CA1 (0.35) | GPR3CA1CA2CA9CA12 | |
| SCHEMBL1089841 | 0.99 | CA1 (0.35) | GPR3CA1CA2CA9CA12 | |
| SCHEMBL3132979 | 0.99 | CA1 (0.35) | GPR3CA1CA2CA9CA12 | |
| SCHEMBL1593707 | 0.96 | GPR3 (0.36) | GPR3CA1CA2CA9CA12 | |
| SCHEMBL271338 | 0.94 | TLR9 (0.35) | GPR3CA1CA2CA9CA12 | |
| SCHEMBL562807 | 0.93 | CA2 (0.36) | CA1CA2CA9MMP1MMP2 | |
| SCHEMBL6117378 | 0.93 | CA2 (0.37) | GPR3CA1CA2MMP1MMP2 | |
| Trifluoromethanesulfonic Acid SCHEMBL7038099 | 0.91 | GPR3 (0.37) | GPR3CA1CA2CA9KCNH2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 689 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026100410-A1 | IODINE-CONTAINING POLYMERIZABLE COMPOUND AND IODINE-CONTAINING POLYMER | 三菱瓦斯化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| EP-4674837-A1 | HETEROPOLYOXOTUNGSTATE COMPOUND, SOLVATE THEREOF, OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE, OR MIXTURE | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-20250362597-A1 | RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-11-27 | — | — | US | disclosed |
| EP-4635963-A1 | ISOPOLYOXOTUNGSTATE SALT COMPOUND, SOLVATE THEREOF OR MIXTURE OF SAID COMPOUND AND SOLVATE, AND METHOD FOR PRODUCING SAID COMPOUND, SOLVATE OR MIXTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-10-22 | — | — | EP | disclosed |
| US-20250321485-A1 | RESIST AUXILIARY FILM COMPOSITION, AND PATTERN FORMING METHOD USING SAME | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-10-16 | — | — | US | disclosed |
| WO-2025094854-A1 | METHOD FOR PRODUCING POLYACID SALTS OR MIXTURES THEREOF, AND METHOD FOR REMOVING IMPURITIES | 東京応化工業株式会社 | 2025-05-08 | — | — | WO | disclosed |
| CN-119452307-A | Resist auxiliary film composition and pattern forming method using the same | 三菱瓦斯化学株式会社 | 2025-02-14 | — | — | CN | disclosed |
| CN-119422108-A | Resist composition and method for forming resist film using same | 三菱瓦斯化学株式会社 | 2025-02-11 | — | — | CN | disclosed |
| WO-2025028579-A1 | METHOD FOR PRODUCING METATUNGSTATE COMPOUND, METATUNGSTATE COMPOUND FOR RESISTS, AND RESIST MATERIAL | 東京応化工業株式会社 | 2025-02-06 | — | — | WO | disclosed |
| US-20250043149-A1 | SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING APPARATUS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-02-06 | — | — | US | disclosed |
| EP-1128212-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-29 | — | — | EP | disclosed |
| US-6280902-B1 | RESIN CONVERTED TO ALKALI SOLUBLE TO ALKALI INSOLUBLE OR ALKALI SLIGHTLY ACID SOLUBLE, AN ACID GENERATOR AND NITROGEN CYCLIC COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-28 | — | — | US | disclosed |
| US-20010016298-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | disclosed |
| US-20010014428-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-16 | — | — | US | disclosed |
| EP-1122606-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1122604-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-1058153-A1 | Positive working photoresist compositions | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | disclosed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | disclosed |
| EP-1020767-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-07-19 | — | — | EP | disclosed |