Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 13/20 | 0.61 |
| ▸ | ESR2 | Q92731 | 13/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.57 |
| ▸ | MEN1 | O00255 | 5/20 | 0.57 |
| ▸ | GAA | P10253 | 5/20 | 0.57 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.57 |
| ▸ | JAK2 | O60674 | 1/20 | 0.57 |
| ▸ | USP2 | O75604 | 1/20 | 0.57 |
| ▸ | MAPT | P10636 | 1/20 | 0.57 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.57 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.57 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.57 |
| ▸ | POLB | P06746 | 2/20 | 0.50 |
| ▸ | TYMS | P04818 | 1/20 | 0.50 |
| ▸ | THRA | P10827 | 1/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | CDC25B | P30305 | 1/20 | 0.37 |
| ▸ | CDK2 | P24941 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1508109 | 0.91 | TYMS (0.56) | ESR1ESR2KMT2AMEN1GAA | |
| SCHEMBL30342255 | 0.91 | TYMS (0.56) | ESR1ESR2KMT2AMEN1GAA | |
| SCHEMBL824860 | 0.90 | ESR1 (0.54) | ESR1ESR2KMT2AMEN1GAA | |
| SCHEMBL220008 | 0.85 | ESR1 (0.49) | ESR1ESR2KMT2AMEN1GAA | |
| SCHEMBL8070515 | 0.84 | HSD17B10 (0.45) | ESR1ESR2KMT2AMEN1GAA | |
| SCHEMBL31295365 | 0.84 | HSD17B10 (0.45) | ESR1ESR2KMT2AMEN1GAA | |
| SCHEMBL10720203 | 0.83 | TYMS (0.56) | ESR1ESR2KMT2AMEN1GAA | |
| SCHEMBL15447071 | 0.83 | TYMS (0.58) | ESR1ESR2KMT2AMEN1GAA | |
| SCHEMBL218920 | 0.82 | THRB (0.50) | ESR1ESR2KMT2AMEN1GAA | |
| SCHEMBL29497650 | 0.82 | THRB (0.50) | ESR1ESR2KMT2AMEN1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 111 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| US-20190346763-A1 | COMPOSITIONS COMPRISING HETERO-SUBSTITUTED CARBOCYCLIC ARYL COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-14 | — | — | US | disclosed |
| US-10359698-B2 | Compositions comprising hetero-substituted carbocyclic aryl component and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-07-23 | — | — | US | disclosed |
| US-9869931-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-9869931-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-01-16 | — | — | US | disclosed |
| US-20170115565-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170115565-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9551928-B2 | Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith | FUJIFILM CORPORATION (JP) | 2017-01-24 | — | — | US | disclosed |
| US-20080166636-A1 | Polymer, Crosslinked Polymer, Composition for Solid Polymer Electrolyte, Solid Polymer Electrolyte, and Adhesive Composition | NIPPON SODA CO., LTD. (JP) | 2008-07-10 | — | — | US | disclosed |
| EP-1923418-A1 | STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF | NIPPON SODA CO., LTD. (JP) | 2008-05-21 | — | — | EP | disclosed |
| US-20080048149-A1 | POLYMERIZABLE LIQUID CRYSTAL COMPOSITION, OPTICAL ANISOTROPIC MATERIAL, OPTICAL ELEMENT AND OPTICAL HEAD DEVICE | ASAHI GLASS COMPANY, LIMITED (JP) | 2008-02-28 | — | — | US | disclosed |
| US-20080048149-A1 | POLYMERIZABLE LIQUID CRYSTAL COMPOSITION, OPTICAL ANISOTROPIC MATERIAL, OPTICAL ELEMENT AND OPTICAL HEAD DEVICE | ASAHI GLASS COMPANY, LIMITED (JP) | 2008-02-28 | — | — | US | disclosed |
| EP-1873228-A1 | POLYMERIZABLE LIQUID CRYSTAL COMPOSITION, OPTICAL ANISOTROPIC MATERIAL, OPTICAL ELEMENT, AND OPTICAL HEAD DEVICE | Asahi Glass Company, Limited (JP) | 2008-01-02 | — | — | EP | disclosed |
| EP-1847556-A1 | POLYMER, CROSSLINKED POLYMER, COMPOSITION FOR SOLID POLYMER ELECTROLYTE, SOLID POLYMER ELECTROLYTE AND ADHESIVE COMPOSITION | NIPPON SODA CO., LTD. (JP) | 2007-10-24 | — | — | EP | disclosed |
| EP-1780224-A1 | MULTIBRANCHED POLYMERS AND PROCESS FOR PRODUCTION THEREOF | NIPPON SODA CO., LTD. (JP) | 2007-05-02 | — | — | EP | disclosed |
| US-20070040145-A1 | e.g.block copolymer of methoxypolyethylene glycol mono (meth)acrylate with monomers selected from unsaturated ether, alcohol, ester, nitrile, carboxy, anhydride etc.; excellent in thermal properties, physical properties and ion conductivity | NIPPON SODA CO., LTD. (JP) | 2007-02-22 | — | — | US | disclosed |
| US-20070040145-A1 | e.g.block copolymer of methoxypolyethylene glycol mono (meth)acrylate with monomers selected from unsaturated ether, alcohol, ester, nitrile, carboxy, anhydride etc.; excellent in thermal properties, physical properties and ion conductivity | NIPPON SODA CO., LTD. (JP) | 2007-02-22 | — | — | US | disclosed |
| EP-1553117-B1 | SOLID POLYMER ELECTROLYTE | NIPPON SODA CO (JP) | 2007-01-17 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | CASR, LIFR, LBR | ESR1 818/4885ESR2 874/4885KMT2A 2108/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.