Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.51 |
| ▸ | GAA | P10253 | 2/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.49 |
| ▸ | RAB9A | P51151 | 3/20 | 0.47 |
| ▸ | NPC1 | O15118 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 3/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.44 |
| ▸ | MITF | O75030 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2674734 | 0.88 | ALDH1A1 (0.53) | ALDH1A1GAAKMT2ARAB9ANPC1 | |
| SCHEMBL13791412 | 0.87 | ALDH1A1 (0.47) | ALDH1A1GAAKMT2ARAB9ANPC1 | |
| SCHEMBL2675822 | 0.87 | KMT2A (0.53) | ALDH1A1GAAKMT2ARAB9ANPC1 | |
| SCHEMBL2200612 | 0.85 | EPHX1 (0.47) | ALDH1A1KMT2ARAB9ANPC1MEN1 | |
| SCHEMBL13172144 | 0.85 | ALDH1A1 (0.50) | ALDH1A1GAAKMT2ARAB9ANPC1 | |
| SCHEMBL793383 | 0.83 | ALDH1A1 (0.43) | ALDH1A1GAAKMT2ARAB9ANPC1 | |
| SCHEMBL542086 | 0.81 | ALDH1A1 (0.55) | ALDH1A1GAAKMT2ARAB9ANPC1 | |
| SCHEMBL10048309 | 0.81 | ALDH1A1 (0.41) | ALDH1A1GAAKMT2ARAB9ANPC1 | |
| SCHEMBL7905311 | 0.81 | ALDH1A1 (0.45) | ALDH1A1KMT2ARAB9ANPC1MEN1 | |
| SCHEMBL2674274 | 0.80 | KMT2A (0.53) | ALDH1A1GAAKMT2ARAB9ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | claimed |
| US-20100080973-A1 | LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| WO-2008035890-A9 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEMICAL LTD (KR) | 2009-04-23 | — | — | WO | claimed |
| WO-2008035890-A1 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2008-03-27 | — | — | WO | claimed |
| EP-3374467-B1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC TECH AG (CH) | 2020-04-15 | — | — | EP | disclosed |
| EP-3081612-B1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO LTD (JP) | 2018-11-14 | — | — | EP | disclosed |
| US-20180320072-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | Rolic Technologies AG (CH) | 2018-11-08 | — | — | US | disclosed |
| EP-3374467-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC Technologies AG (CH) | 2018-09-19 | — | — | EP | disclosed |
| US-9718999-B2 | Photocurable composition having adhesive properties | CEMEDINE CO., LTD (JP) | 2017-08-01 | — | — | US | disclosed |
| WO-2017080977-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC AG (CH) | 2017-05-18 | — | — | WO | disclosed |
| US-20160312089-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO., LTD. (JP) | 2016-10-27 | — | — | US | disclosed |
| EP-3081612-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | Cemedine Co., Ltd. (JP) | 2016-10-19 | — | — | EP | disclosed |
| EP-1909142-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ADHESION ENHANCER | TORAY INDUSTRIES, INC. (JP) | 2008-04-09 | — | — | EP | disclosed |
| US-7354521-B2 | Method of fabricating inkjet print head using photocurable resin composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-04-08 | — | — | US | disclosed |
| WO-2008035890-A1 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2008-03-27 | — | — | WO | disclosed |
| EP-0633502-B1 | PATTERN FORMING MATERIAL | CLARIANT FINANCE BVI LTD (VG) | 2002-03-20 | — | — | EP | disclosed |
| US-6197475-B1 | FILM PROPERTY, HEAT-RESISTANCE, ADHESIVITY AND IMAGE-FORMABILITY WHICH DOES NOT REQUIRE COMPLEX STEPS FOR PREPARATION AND DOES NOT CAUSE CONTAMINATION WITH CHLORIDES | HITACHI CHEMICAL CO., LTD. (JP) | 2001-03-06 | — | — | US | disclosed |
| EP-0622682-B1 | Photosensitive resin composition | HITACHI CHEMICAL CO LTD (JP) | 1998-03-04 | — | — | EP | disclosed |
| EP-0633502-A1 | PATTERN FORMING MATERIAL | HOECHST JAPAN LIMITED (JP) | 1995-01-11 | — | — | EP | disclosed |
| EP-0622682-A1 | Photosensitive resin composition | HITACHI CHEMICAL CO., LTD. (JP) | 1994-11-02 | — | — | EP | disclosed |