SCHEMBL793383

SCHEMBL793383

Cc1ccccc1C(C)OC(=O)NC1CCC(CC2CCC(NC(=O)OC(C)c3ccccc3[N+](=O)[O-])CC2)CC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
DRD2 P14416 1/20 0.38
KMT2A Q03164 2/20 0.36
CHRNB2 P17787 1/20 0.36
CHRNB4 P30926 1/20 0.36
CHRNA3 P32297 1/20 0.36
CHRNA7 P36544 1/20 0.36
CHRNA4 P43681 1/20 0.36
HTR3A P46098 1/20 0.36
GAA P10253 1/20 0.35
CYP1A2 P05177 2/20 0.35
TSHR P16473 1/20 0.35
MEN1 O00255 1/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
LMNA P02545 2/20 0.35
HSD17B10 Q99714 1/20 0.35
HPGD P15428 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13791412 0.95 ALDH1A1 (0.47) ALDH1A1L3MBTL1SMN1; SMN2DRD2KMT2A
SCHEMBL10048309 0.87 ALDH1A1 (0.41) ALDH1A1L3MBTL1SMN1; SMN2DRD2KMT2A
SCHEMBL2201239 0.83 ALDH1A1 (0.51) ALDH1A1L3MBTL1SMN1; SMN2KMT2AGAA
SCHEMBL18684993 0.72 ALDH1A1 (0.52) ALDH1A1SMN1; SMN2KMT2AGAACYP1A2
SCHEMBL11964040 0.72 ALDH1A1 (0.60) ALDH1A1L3MBTL1SMN1; SMN2KMT2AGAA
SCHEMBL542086 0.72 ALDH1A1 (0.55) ALDH1A1SMN1; SMN2KMT2AGAACYP1A2
SCHEMBL2674734 0.72 ALDH1A1 (0.53) ALDH1A1L3MBTL1SMN1; SMN2KMT2AGAA
SCHEMBL2675822 0.71 KMT2A (0.53) ALDH1A1L3MBTL1SMN1; SMN2KMT2AGAA
SCHEMBL8654472 0.70 ALDH1A1 (0.50) ALDH1A1L3MBTL1SMN1; SMN2KMT2AGAA
SCHEMBL7718000 0.70 ALDH1A1 (0.52) ALDH1A1SMN1; SMN2KMT2AGAACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9235119-B2 Exposure photolithography methods GLOBALFOUNDRIES INC. (KY) 2016-01-12 US disclosed
US-20140349237-A1 EXPOSURE PHOTOLITHOGRAPHY METHODS GLOBALFOUNDRIES U.S. INC. 2014-11-27 US disclosed
US-8846296-B2 Photoresist compositions INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-09-30 US disclosed
US-8568960-B2 Multiple exposure photolithography methods INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-10-29 US disclosed
US-8394573-B2 Photoresist compositions and methods for shrinking a photoresist critical dimension INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-03-12 US disclosed
US-20120214099-A1 PHOTORESIST COMPOSITIONS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-08-23 US disclosed
US-20120178027-A1 MULTIPLE EXPOSURE PHOTOLITHOGRAPHY METHODS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-07-12 US disclosed
US-20120070787-A1 PHOTORESIST COMPOSITIONS AND METHODS FOR SHRINKING A PHOTORESIST CRITICAL DIMENSION INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-03-22 US disclosed
US-7838198-B2 Photoresist compositions and method for multiple exposures with multiple layer resist systems INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2010-11-23 US disclosed