SCHEMBL2201862

SCHEMBL2201862

Nc1ncc(O)c(O)n1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4583821 0.79
SCHEMBL338978 0.79
SCHEMBL13729792 0.78 MEN1 (0.32)
Hydrochloric Acid SCHEMBL29531530 0.77 DHFR (0.40)
Hydrochloric Acid SCHEMBL28731820 0.77 DHFR (0.40)
SCHEMBL20418620 0.75
SCHEMBL1613277 0.75
SCHEMBL3655582 0.75
SCHEMBL3043531 0.75
SCHEMBL31160735 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2809157-B1 FUNGICIDAL PYRAZOLE MIXTURES DU PONT (US) 2017-09-06 EP claimed
JP-8239367-A None JP disclosed
CN-110959138-B Resist material DIC株式会社 2023-06-30 CN disclosed
US-11487204-B2 Resist material DIC CORPORATION (JP) 2022-11-01 US disclosed
CN-108368214-B Novolac resin and resist film DIC株式会社 2021-03-23 CN disclosed
CN-108368213-B Novolac resin and resist film DIC株式会社 2020-12-18 CN disclosed
CN-107003612-B Photosensitive composition for forming resist underlayer film, and resist underlayer film DIC株式会社 2020-11-06 CN disclosed
US-20200166838-A1 RESIST MATERIAL DIC CORPORATION (JP) 2020-05-28 US disclosed
CN-110959138-A Resist material DIC株式会社 2020-04-03 CN disclosed
CN-105190439-B Modified novolac type phenolic resin, erosion resistant, film and permanent film against corrosion DIC株式会社 2019-05-17 CN disclosed
EP-1275666-A1 NOVEL FLUOROPOLYMER HAVING ACID-REACTIVE GROUP AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME Daikin Industries, Ltd. (JP) 2003-01-15 EP disclosed
EP-1250908-A2 Hair dye GOLDWELL GmbH (DE) 2002-10-23 EP disclosed
US-6090518-A HAVING HIGH RESOLUTION, WHICH IS USEFUL FOR A HALFMICRONLITHOGRAPHY EMPLOYING A RADIATION MITSUBISHI CHEMICAL CORPORATION (JP) 2000-07-18 US disclosed
JP-H08239367-A PRODUCTION OF 2-AMINO-4,6-DICHLOROPYRIMIDINE NISSAN CHEM IND LTD 1996-09-17 JP disclosed
US-4880885-A Polymerization reactor provided with coating that suppresses polymer deposit formation WACKER-CHEMIE GMBH (DE) 1989-11-14 US disclosed
EP-0152115-B1 PROCESS FOR PREPARING POLYMERS OF ETHYLENICALLY UNSATURATED COMPOUNDS Wacker-Chemie GmbH (DE) 1989-02-08 EP disclosed
EP-0152115-A2 Process for preparing polymers of ethylenically unsaturated compounds Wacker-Chemie GmbH (DE) 1985-08-21 EP disclosed
EP-0003923-B1 SUPPORT-ENZYME COMPLEXES AND METHOD FOR PREPARING THEM RHONE-POULENC SPECIALITES CHIMIQUES (FR) 1982-10-20 EP disclosed
US-4258133-A Enzyme-support complexes RHONE-POULENC INDUSTRIES (FR) 1981-03-24 US disclosed
EP-0003923-A1 Support-enzyme complexes and method for preparing them RHONE-POULENC SPECIALITES CHIMIQUES (FR) 1979-09-05 EP disclosed