Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOTUM | Q6P988 | 2/20 | 0.45 |
| ▸ | AKT1 | P31749 | 1/20 | 0.37 |
| ▸ | CES2 | O00748 | 3/20 | 0.37 |
| ▸ | CFTR | P13569 | 2/20 | 0.35 |
| ▸ | P2RX1 | P51575 | 2/20 | 0.35 |
| ▸ | TMPRSS4 | Q9NRS4 | 1/20 | 0.35 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.34 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.33 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.33 |
| ▸ | SLC6A9 | P48067 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22043721 | 0.76 | CES2 (0.43) | AKT1CES2P2RX1GPR35ALDH1A1 | |
| SCHEMBL23231573 | 0.73 | CFTR (0.53) | NOTUMCES2CFTRP2RX1TMPRSS4 | |
| SCHEMBL19541391 | 0.73 | NOTUM (0.62) | NOTUMCES2CFTRP2RX1GPR35 | |
| SCHEMBL8572333 | 0.71 | CFTR (0.58) | NOTUMCES2CFTRGPR35ALDH1A1 | |
| SCHEMBL26488245 | 0.71 | NOTUM (0.47) | NOTUMCFTRP2RX1TMPRSS4GPR35 | |
| SCHEMBL30628783 | 0.70 | CES2 (0.47) | NOTUMCES2GPR35CYP3A4 | |
| SCHEMBL21367459 | 0.70 | CFTR (0.49) | NOTUMCES2CFTRP2RX1TMPRSS4 | |
| SCHEMBL425494 | 0.70 | NOTUM (0.46) | NOTUMCFTRP2RX1TMPRSS4GPR35 | |
| SCHEMBL31031798 | 0.69 | CES2 (0.43) | NOTUMCES2CFTRGPR35 | |
| SCHEMBL31031802 | 0.69 | CES2 (0.43) | NOTUMCES2CFTRGPR35 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11586111-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-02-21 | — | — | US | disclosed |
| US-20200174369-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-04 | — | — | US | disclosed |