SCHEMBL2206286

SCHEMBL2206286

Cc1cc(-c2ccccc2)c(N)c(N)c1C

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 1/20 0.42
ALDH1A1 P00352 6/20 0.41
HSD17B10 Q99714 3/20 0.41
CYP2A6 P11509 1/20 0.41
CYP2B6 P20813 1/20 0.41
PDE4A P27815 1/20 0.41
PDE4B Q07343 1/20 0.41
PDE4C Q08493 1/20 0.41
PDE4D Q08499 1/20 0.41
PDE3B Q13370 1/20 0.41
PDE3A Q14432 1/20 0.41
KDM4E B2RXH2 4/20 0.40
MAPT P10636 3/20 0.40
POLB P06746 2/20 0.40
MEN1 O00255 2/20 0.40
RAB9A P51151 2/20 0.40
KMT2A Q03164 2/20 0.40
PKM P14618 1/20 0.40
DHFR P00374 1/20 0.40
SMARCA2 P51531 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27544380 0.88 ESR2 (0.42) ESR2ALDH1A1HSD17B10CYP2A6CYP2B6
SCHEMBL28278761 0.88 ESR2 (0.42) ESR2ALDH1A1HSD17B10CYP2A6CYP2B6
SCHEMBL2849079 0.83 ESR2 (0.42) ESR2ALDH1A1HSD17B10CYP2A6CYP2B6
SCHEMBL2852708 0.83 PDE4A (0.44) ESR2ALDH1A1HSD17B10CYP2A6CYP2B6
SCHEMBL27621237 0.82 ESR2 (0.39) ESR2ALDH1A1HSD17B10CYP2A6CYP2B6
Hydrochloric Acid SCHEMBL27939010 0.82 PDE4A (0.47) ESR2ALDH1A1HSD17B10CYP2A6CYP2B6
SCHEMBL28754177 0.79 PDE4A (0.44) ESR2ALDH1A1HSD17B10CYP2A6CYP2B6
SCHEMBL28348785 0.78 CYP1A1 (0.42) ESR2ALDH1A1HSD17B10CYP2A6CYP2B6
SCHEMBL26782066 0.78 ESR2 (0.41) ESR2ALDH1A1HSD17B10CYP2A6CYP2B6
Hydrochloric Acid SCHEMBL28477097 0.78 PDE4A (0.43) ESR2ALDH1A1HSD17B10CYP2A6CYP2B6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 170 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260015454-A1 HIGH PERFORMANCE, AMBIENT CURE POLYURETHANES COMPRISING POLYCAPROLACTONE POLYOLS INGEVITY UK LTD (GB) 2026-01-15 US claimed
EP-4594381-A1 NOVEL POLYURETHANE OR POLYURETHANE-UREA COMPOSITION WITH ENHANCED LOW TEMPERATURE PERFORMANCE Ingevity UK Ltd (GB) 2025-08-06 EP claimed
US-20250243313-A1 POLYCAPROLACTONE POLYOLS, ELASTOMERS, AND METHODS OF MAKING AND USING THE SAME INGEVITY UK LTD (GB) 2025-07-31 US claimed
US-20250230274-A1 POLYCAPROLACTONE POLYOLS, POLYURETHANE DISPERSIONS, AND METHODS OF MAKING AND USING THE SAME INGEVITY UK LTD (GB) 2025-07-17 US claimed
WO-2025149744-A1 POLYCAPROLACTONE POLYOLS, POLYURETHANE DISPERSIONS, AND METHODS OF MAKING AND USING THE SAME INGEVITY UK LTD (GB) 2025-07-17 WO claimed
CN-120092033-A Novel polyurethane or polyurethane-urea compositions with enhanced low temperature properties 英格维蒂英国有限公司 2025-06-03 CN claimed
CN-114261149-B Polyimide arc-proof clothing fabric and arc-proof clothing 江苏先诺新材料科技有限公司 2024-08-13 CN claimed
CN-118307737-A Degradable and recyclable polyether polyurethane and preparation method thereof 华南理工大学 2024-07-09 CN claimed
WO-2024068129-A1 NOVEL POLYURETHANE OR POLYURETHANE-UREA COMPOSITION WITH ENHANCED LOW TEMPERATURE PERFORMANCE INGEVITY UK LTD. (GB) 2024-04-04 WO claimed
US-20240110002-A1 NOVEL POLYURETHANE OR POLYURETHANE-UREA COMPOSITION WITH ENHANCED LOW TEMPERATURE PERFORMANCE INGEVITY UK LTD (GB) 2024-04-04 US claimed
CN-111093323-A Circuit substrate and preparation method thereof 住井工业(湖南)有限公司 2020-05-01 CN claimed
CN-110591047-A Degradable polyether polyurethane and preparation method thereof 华南理工大学 2019-12-20 CN claimed
EP-2486975-B1 FAST MIXING REACTOR AND USE THEREOF WANHUA CHEMICAL GROUP CO LTD (CN) 2015-09-23 EP claimed
US-9138717-B2 High-speed mixing reactor and application thereof WANHUA CHEMICAL GROUP CO., LTD (CN) 2015-09-22 US claimed
US-20130178596-A1 HIGH-SPEED MIXING REACTOR AND APPLICATION THEREOF YANTAI WANHUA POLYURETHANES CO., LTD. (CN) 2013-07-11 US claimed
EP-2486975-A1 FAST MIXING REACTOR AND USE THEREOF Yantai Wanhua Polyurethanes Co., Ltd. (CN) 2012-08-15 EP claimed
EP-0929841-A4 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE QUANTUM COMPONENTS COLORAD (US) 2001-04-18 EP claimed
US-5955244-A Method for forming photoresist features having reentrant profiles using a basic agent QUANTUM CORPORATION (US) 1999-09-21 US claimed
EP-0929841-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT Mke-Quantum Components Colorado LLC (US) 1999-07-21 EP claimed
WO-1998008143-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE-QUANTUM COMPONENTS COLORADO LLC (US) 1998-02-26 WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260015454-A1 HIGH PERFORMANCE, AMBIENT CURE POLYURETHANES COMPRISING POLYCAPROLACTONE POLYOLS PUF60, MORF4L1, C9 ESR2 1172/4885ALDH1A1 538/4885HSD17B10 223/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.