Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26002899 | 0.89 | TSHR (0.39) | TSHRTHRBALDH1A1 | |
| SCHEMBL2208117 | 0.86 | — | — | |
| SCHEMBL2206457 | 0.82 | TSHR (0.43) | TSHRTHRB | |
| SCHEMBL75712 | 0.81 | ALDH1A1 (0.38) | TSHRALDH1A1 | |
| SCHEMBL23489441 | 0.78 | TDP1 (0.30) | — | |
| SCHEMBL2204543 | 0.78 | TSHR (0.36) | TSHRTHRBALDH1A1 | |
| SCHEMBL2734950 | 0.78 | TSHR (0.44) | TSHRTHRBALDH1A1 | |
| SCHEMBL10094797 | 0.75 | — | — | |
| SCHEMBL22662270 | 0.74 | TSHR (0.38) | TSHRTHRBALDH1A1 | |
| SCHEMBL12427755 | 0.74 | TSHR (0.38) | TSHRTHRBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021111913-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND | JSR株式会社 | 2021-06-10 | — | — | WO | disclosed |
| US-7981589-B2 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-19 | — | — | US | disclosed |
| US-7981589-B2 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-19 | — | — | US | disclosed |
| US-7981589-B2 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-07-19 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20090035699-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20090035699-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20090035699-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-05 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090035699-A1 | FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | C1R, AFF1, HRH3 | TSHR 861/4885THRB 2061/4885ALDH1A1 2055/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.