SCHEMBL2209442

SCHEMBL2209442

Cc1c(O)ccc2ccc(O)cc12

nearest known ligand 0.58

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 11/20 0.58
ESR2 Q92731 11/20 0.58
MCL1 Q07820 1/20 0.46
NR1I2 O75469 2/20 0.42
LMNA P02545 2/20 0.40
ALDH1A1 P00352 1/20 0.40
CYP2C9 P11712 1/20 0.40
MIF P14174 1/20 0.40
TYR P14679 1/20 0.40
ALOX15 P16050 1/20 0.40
HTT P42858 1/20 0.40
NFE2L2 Q16236 1/20 0.40
HSD17B10 Q99714 1/20 0.40
MAOB P27338 1/20 0.40
CYP1A2 P05177 1/20 0.39
TLR8 Q9NR97 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29771841 1.00 ESR1 (0.58) ESR1ESR2MCL1NR1I2LMNA
SCHEMBL1206773 0.84 ESR1 (0.72) ESR1ESR2CYP2C9CYP1A2TLR8
SCHEMBL3959261 0.82 TRPA1 (0.52) ESR1ESR2LMNAALDH1A1ALOX15
Betanaphthol SCHEMBL17506723 0.81 CYP1A2 (0.61) ESR1ESR2MCL1LMNACYP2C9
SCHEMBL12341939 0.78 CTDSP1 (0.57) ESR1ESR2LMNAALDH1A1CYP2C9
SCHEMBL20306775 0.77 ESR2 (0.42) ESR1ESR2ALDH1A1HTTHSD17B10
SCHEMBL670670 0.77 CYP1A2 (0.52) ESR1ESR2MCL1LMNAALDH1A1
SCHEMBL29848183 0.76 ESR1 (0.44) ESR1ESR2MCL1LMNACYP2C9
SCHEMBL3212292 0.76 PTPN22 (0.56) ESR1ESR2MCL1LMNAALOX15
SCHEMBL12251173 0.76 ESR1 (0.44) ESR1ESR2MCL1LMNACYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240270891-A1 PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKALINE DEVELOPABLE RESIST, RESIST CURABLE RESIN COMPOSITION, AND METHOD FOR PRODUCING PHENOLIC HYDROXY GROUP-CONTAINING RESIN DIC CORPORATION (JP) 2024-08-15 US disclosed
CN-116209690-A Phenolic hydroxyl group-containing resin, resin composition for alkali-developable resist, resist-curable resin composition, and method for producing phenolic hydroxyl group-containing resin DIC株式会社 2023-06-02 CN disclosed
CN-115873214-A Epoxy resin, photosensitive resin composition, resist film, curable composition, and cured film DIC株式会社 2023-03-31 CN disclosed
EP-3854848-B1 RESIN COMPOSITION, CURED OBJECT, AND LAMINATE DAINIPPON INK & CHEMICALS (JP) 2023-01-25 EP disclosed
CN-109960111-B Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and method for forming pattern 信越化学工业株式会社 2022-07-12 CN disclosed
EP-3362518-B1 SENSOR DYES FOR REAL-TIME SENSING OF METAL IONS IN AQUEOUS ENVIRONMENTS THE UWM RES FOUNDATION INC (US) 2022-04-27 EP disclosed
WO-2022065041-A1 RESIN CONTAINING PHENOLIC HYDROXYL GROUP, RESIN COMPOSITION FOR ALKALI-DEVELOPABLE RESISTS, RESIST CURABLE RESIN COMPOSITION, AND METHOD FOR PRODUCING RESIN CONTAINING PHENOLIC HYDROXYL GROUP DIC株式会社 2022-03-31 WO disclosed
US-11018015-B2 Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-25 US disclosed
EP-3508918-B1 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2020-07-15 EP disclosed
WO-2020053196-A1 METHOD FOR THE BIOCATALYTIC ALKYLATION OF A SUBSTRATE UNIVERSITÄT BASEL (CH) 2020-03-19 WO disclosed
US-20160018735-A1 COMPOUND FOR FORMING ORGANIC FILM, AND ORGANIC FILM COMPOSITION USING THE SAME, PROCESS FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2016-01-21 US disclosed
CN-104768978-A Photopolymerizable resin composition for molding, and molded multilayer article DAINIPPON INK & CHEMICALS 2015-07-08 CN disclosed
EP-2343327-B1 CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF, PRINTED CIRCUIT BOARD, AND EPOXY RESIN AND METHOD FOR PRODUCING SAME DAINIPPON INK & CHEMICALS (JP) 2013-07-24 EP disclosed
CN-102186898-B Curable resin composition and cured product thereof, printed circuit board, and epoxy resin and method for producing same DAINIPPON INK & CHEMICALS 2013-03-13 CN disclosed
US-8168731-B2 Curable resin composition, cured product thereof, printed wiring board, epoxy resin, and process for producing the same DIC CORPORATION (JP) 2012-05-01 US disclosed
CN-101213490-B Photosensitive resin composition DAINIPPON INK & CHEMICALS 2011-11-02 CN disclosed
US-20110259628-A1 CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, PRINTED WIRING BOARD, EPOXY RESIN, AND PROCESS FOR PRODUCING THE SAME DIC CORPORATION (JP) 2011-10-27 US disclosed
CN-102186898-A Curable resin composition and cured product thereof, printed circuit board, and epoxy resin and method for producing same DAINIPPON INK & CHEMICALS 2011-09-14 CN disclosed
EP-2343327-A1 CURABLE RESIN COMPOSITION AND CURED PRODUCT THEREOF, PRINTED CIRCUIT BOARD, AND EPOXY RESIN AND METHOD FOR PRODUCING SAME DIC Corporation (JP) 2011-07-13 EP disclosed
CN-101213490-A Photosensitive resin composition DAINIPPON INK & CHEMICALS (JP) 2008-07-02 CN disclosed