⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22403232 | 0.79 | SCN9A (0.30) | — | |
| SCHEMBL26068002 | 0.75 | — | — | |
| SCHEMBL19678504 | 0.73 | — | — | |
| SCHEMBL19756193 | 0.72 | — | — | |
| SCHEMBL21911814 | 0.69 | — | — | |
| SCHEMBL21912392 | 0.68 | GRM1 (0.46) | — | |
| SCHEMBL22097479 | 0.68 | SCN9A (0.33) | — | |
| SCHEMBL19756177 | 0.67 | — | — | |
| SCHEMBL23843751 | 0.67 | — | — | |
| SCHEMBL25475714 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |