Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 6/20 | 0.33 |
| ▸ | CA2 | P00918 | 6/20 | 0.33 |
| ▸ | MMP1 | P03956 | 1/20 | 0.33 |
| ▸ | MMP2 | P08253 | 1/20 | 0.33 |
| ▸ | MMP9 | P14780 | 1/20 | 0.33 |
| ▸ | MMP8 | P22894 | 1/20 | 0.33 |
| ▸ | MMP13 | P45452 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.30 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22097545 | 0.90 | HDAC6 (0.35) | HDAC6CA1CA2MMP1MMP2 | |
| SCHEMBL26343810 | 0.74 | TTR (0.35) | HDAC6CA1CA2MMP1MMP2 | |
| SCHEMBL22097550 | 0.74 | MAPK1 (0.34) | CA1CA2 | |
| SCHEMBL26343807 | 0.73 | HDAC6 (0.35) | HDAC6CA1CA2MMP1MMP2 | |
| SCHEMBL13590940 | 0.71 | CA1 (0.52) | HDAC6CA1CA2MMP1MMP2 | |
| SCHEMBL22097591 | 0.65 | HDAC6 (0.37) | HDAC6CA1CA2MMP1MMP2 | |
| SCHEMBL21783789 | 0.61 | DPP4 (0.43) | CA1CA2HPGD | |
| SCHEMBL26343837 | 0.61 | CA1 (0.39) | HDAC6CA1CA2MMP1MMP2 | |
| SCHEMBL23388546 | 0.60 | HDAC6 (0.64) | HDAC6CA1CA2MMP1MMP2 | |
| SCHEMBL30150622 | 0.60 | HDAC6 (0.64) | HDAC6CA1CA2MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |