Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DPP4 | P27487 | 2/20 | 0.43 |
| ▸ | CA12 | O43570 | 4/20 | 0.42 |
| ▸ | CA1 | P00915 | 4/20 | 0.42 |
| ▸ | CA2 | P00918 | 4/20 | 0.42 |
| ▸ | CA7 | P43166 | 4/20 | 0.42 |
| ▸ | CA9 | Q16790 | 4/20 | 0.42 |
| ▸ | CA14 | Q9ULX7 | 4/20 | 0.42 |
| ▸ | TPMT | P51580 | 2/20 | 0.37 |
| ▸ | GLRA3 | O75311 | 1/20 | 0.35 |
| ▸ | GLRB | P48167 | 1/20 | 0.35 |
| ▸ | SELL | P14151 | 2/20 | 0.34 |
| ▸ | SELP | P16109 | 2/20 | 0.34 |
| ▸ | LDHA | P00338 | 2/20 | 0.33 |
| ▸ | LDHB | P07195 | 2/20 | 0.33 |
| ▸ | TP53 | P04637 | 2/20 | 0.33 |
| ▸ | CA3 | P07451 | 2/20 | 0.33 |
| ▸ | CA4 | P22748 | 2/20 | 0.33 |
| ▸ | CA6 | P23280 | 2/20 | 0.33 |
| ▸ | CA5A | P35218 | 2/20 | 0.33 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19200647 | 0.86 | SELL (0.46) | DPP4CA12CA1CA2CA7 | |
| SCHEMBL4849716 | 0.77 | TPMT (0.42) | DPP4CA12CA1CA2CA7 | |
| SCHEMBL23600933 | 0.76 | CA1 (0.44) | DPP4CA12CA1CA2CA7 | |
| SCHEMBL4851263 | 0.74 | CA12 (0.52) | CA12CA1CA2CA7CA9 | |
| SCHEMBL28106442 | 0.73 | CYP1A2 (0.46) | CA12CA1CA2CA7CA9 | |
| SCHEMBL18585486 | 0.73 | SELL (0.60) | CA12CA1CA2CA7CA9 | |
| SCHEMBL24040210 | 0.73 | PDE10A (0.37) | CA12CA1CA2CA7CA9 | |
| SCHEMBL19730668 | 0.71 | CA12 (0.44) | DPP4CA12CA1CA2CA7 | |
| SCHEMBL23600928 | 0.71 | TPMT (0.48) | DPP4CA12CA1CA2CA7 | |
| SCHEMBL21783790 | 0.71 | TPMT (0.48) | DPP4CA12CA1CA2CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250214921-A1 | METHOD FOR PRODUCING CYCLIC DIKETONE COMPOUND | KAO CORPORATION (JP) | 2025-07-03 | — | — | US | disclosed |
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| WO-2023223624-A1 | RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RADIATION SENSITIVE ACID GENERATOR, AND ACID DIFFUSION CONTROL AGENT | JSR株式会社 | 2023-11-23 | — | — | WO | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| WO-2023013592-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-02-09 | — | — | WO | disclosed |
| US-11415887-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-08-16 | — | — | US | disclosed |
| US-20220121117-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND, AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-20220121116-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-11187980-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-30 | — | — | US | disclosed |
| US-11181823-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-23 | — | — | US | disclosed |
| US-20210302838-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-30 | — | — | US | disclosed |
| US-20200272048-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-08-27 | — | — | US | disclosed |
| US-20200241414-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |
| US-20200241418-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20200073237-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-05 | — | — | US | disclosed |
| CN-104070307-B | Solder flux composition and solder composition | 株式会社田村制作所 | 2018-02-23 | — | — | CN | disclosed |
| CN-104070307-A | FLUX COMPOSITION AND SOLDER COMPOSITION | TAMURA SEISAKUSHO KK | 2014-10-01 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200241414-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | INSR, HNRNPU, HNRNPR | DPP4 3142/4885CA12 2165/4885CA1 2684/4885 |
| US-20250214921-A1 | METHOD FOR PRODUCING CYCLIC DIKETONE COMPOUND | HSD17B7, HSD17B12, BCKDK | DPP4 2461/4885CA12 2616/4885CA1 2942/4885 |
| US-11181823-B2 | Resist composition and patterning process | BICRA, HNRNPU, INSR | DPP4 3752/4885CA12 2292/4885CA1 3165/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.