Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.32 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.32 |
| ▸ | CCR2 | P41597 | 2/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.30 |
| ▸ | PTGFR | P43088 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22097548 | 0.85 | MAPK1 (0.35) | MAPK1SMN1; SMN2CA2SCN5ASCN9A | |
| SCHEMBL22789846 | 0.83 | RXFP1 (0.39) | MAPK1SMN1; SMN2CA2SCN5ASCN9A | |
| SCHEMBL22789926 | 0.75 | SCN5A (0.40) | MAPK1SMN1; SMN2CA2SCN5ASCN9A | |
| SCHEMBL22097547 | 0.74 | HDAC6 (0.36) | CA2CA1 | |
| SCHEMBL22403149 | 0.73 | RXFP1 (0.36) | MAPK1SMN1; SMN2CA2SCN5ASCN9A | |
| SCHEMBL22403176 | 0.72 | TTR (0.38) | MAPK1CA2SCN5ASCN9ACCR2 | |
| SCHEMBL22503119 | 0.71 | TRPV1 (0.50) | CA2SCN5ASCN9ACA1PTPN1 | |
| SCHEMBL22503312 | 0.71 | KMT2A (0.46) | — | |
| SCHEMBL22503182 | 0.70 | CES2 (0.36) | MAPK1SMN1; SMN2CA2SCN5ASCN9A | |
| SCHEMBL17693112 | 0.70 | HTT (0.41) | MAPK1SMN1; SMN2CA2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |