SCHEMBL221240

SCHEMBL221240

CC(=O)CC(=O)C(=O)O.[InH3]

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ EGLN1 Q9GZT9 2/20 0.42
▸ KDM4E B2RXH2 1/20 0.42
▸ KDM6B O15054 1/20 0.42
▸ KDM5C P41229 1/20 0.42
▸ PHF8 Q9UPP1 1/20 0.42
▸ KDM2A Q9Y2K7 1/20 0.42
▸ MGAM O43451 1/20 0.41
▸ GAA P10253 1/20 0.41
▸ SI P14410 1/20 0.41
▸ MGAM2 Q2M2H8 1/20 0.41
▸ OR51E2 Q9H255 2/20 0.40
▸ HAO1 Q9UJM8 1/20 0.39
▸ HTT P42858 1/20 0.38
▸ FEN1 P39748 4/20 0.37
▸ ERCC5 P28715 3/20 0.37
▸ PTPN1 P18031 1/20 0.37
▸ ALDH1A1 P00352 2/20 0.37
▸ TDP1 Q9NUW8 1/20 0.37
▸ LMNA P02545 1/20 0.36
▸ SLC15A2 Q16348 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19423 0.97 — —
SCHEMBL5420640 0.94 EGLN1 (0.42) EGLN1KDM4EKDM6BKDM5CPHF8
SCHEMBL999954 0.94 EGLN1 (0.42) EGLN1KDM4EKDM6BKDM5CPHF8
SCHEMBL1966887 0.94 EGLN1 (0.42) EGLN1KDM4EKDM6BKDM5CPHF8
SCHEMBL1245971 0.94 EGLN1 (0.42) EGLN1KDM4EKDM6BKDM5CPHF8
SCHEMBL487638 0.94 EGLN1 (0.42) EGLN1KDM4EKDM6BKDM5CPHF8
SCHEMBL1171104 0.94 EGLN1 (0.42) EGLN1KDM4EKDM6BKDM5CPHF8
SCHEMBL2927603 0.94 EGLN1 (0.42) EGLN1KDM4EKDM6BKDM5CPHF8
Water SCHEMBL7871948 0.94 EGLN1 (0.42) EGLN1KDM4EKDM6BKDM5CPHF8
SCHEMBL9316175 0.94 EGLN1 (0.42) EGLN1KDM4EKDM6BKDM5CPHF8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7858151-B2 Elements of groups IB, IIIA, VIB formed by placing a substrate in a treatment chamber, performing atomic layer deposition of a group IB element and/or group IIIA elements from separate sources onto a substrate to form a film, group VIA element is then incorporated into the film; solar cell; lamination NANOSOLAR, INC. (US) 2010-12-28 — — US claimed
WO-2005081789-A2 Formation of CIGS Absorber Layer by Atomic Layer Deposition NANOSOLAR, INC. (US) 2005-09-09 — — WO claimed
US-20050186342-A1 Elements of groups IB, IIIA, VIB formed by placing a substrate in a treatment chamber, performing atomic layer deposition of a group IB element and/or group IIIA elements from separate sources onto a substrate to form a film, group VIA element is then incorporated into the film; solar cell; lamination NANOSOLAR, INC. (US) 2005-08-25 — — US claimed
EP-0175383-B1 CERAMIC MATERIALS FROM SILAZANE POLYMERS DOW CORNING CORPORATION (US) 1989-08-09 — — EP claimed
EP-0175383-A2 Ceramic materials from silazane polymers DOW CORNING CORPORATION (US) 1986-03-26 — — EP claimed
US-9249264-B2 Hybrid vehicle systems ENVONT LLC (US) 2016-02-02 — — US disclosed
EP-2388301-B1 A group 6A/group 3A ink and methods of making and using same ROHM & HAAS ELECT MAT (US) 2015-01-21 — — EP disclosed
EP-2388300-B1 A selenium/group 3A ink and methods of making and using same ROHM & HAAS ELECT MAT (US) 2014-10-22 — — EP disclosed
US-8709917-B2 Selenium/group 3A ink and methods of making and using same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-04-29 — — US disclosed
US-20130059410-A1 Solution-Based Fabrication of Photovoltaic Cell NANOSOLAR, INC. (US) 2013-03-07 — — US disclosed
US-8366973-B2 Solution-based fabrication of photovoltaic cell Nanosolar, Inc (US) 2013-02-05 — — US disclosed
US-8206616-B2 Reacting such as cuprous chloride, indium trichloride, trioctylphospine selenide and trioctylphosphine oxide to form copper indium selenide; producing active layers without exposure to toxic gases; uniform, high quality absorber films NANOSOLAR, INC. (US) 2012-06-26 — — US disclosed
US-6344306-B1 DECOMPOSITION PRODUCT PRODUCED AT AN INTERFACE BETWEEN THE INK ACCEPTING LAYER AND THE SILICONE RUBBER LAYER BY EXPOSURE OF THE PRINTING PLATE PRECURSOR TO A LASER BEAM TORAY INDUSTRIES, INC. (JP) 2002-02-05 — — US disclosed
EP-1036654-A1 Directly imageable waterless planographic printing plate precursor and plate TORAY INDUSTRIES, INC. (JP) 2000-09-20 — — EP disclosed
EP-0914942-A2 Directly imageable waterless planographic printing plate precursor and a method of producing planographic printing plates TORAY INDUSTRIES, INC. (JP) 1999-05-12 — — EP disclosed
EP-0241845-B1 ANTIFOULANTS FOR THERMAL CRACKING PROCESSES PHILLIPS PETROLEUM COMPANY (US) 1990-08-29 — — EP disclosed
EP-0175383-B1 CERAMIC MATERIALS FROM SILAZANE POLYMERS DOW CORNING CORPORATION (US) 1989-08-09 — — EP disclosed
EP-0241845-A1 Antifoulants for thermal cracking processes PHILLIPS PETROLEUM COMPANY (US) 1987-10-21 — — EP disclosed
US-4687567-A INDIUM-TIN OR INDIUM-ANTIMONY PHILLIPS PETROLEUM COMPANY (US) 1987-08-18 — — US disclosed
EP-0175383-A2 Ceramic materials from silazane polymers DOW CORNING CORPORATION (US) 1986-03-26 — — EP disclosed
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