SCHEMBL221345

SCHEMBL221345

C=C(C(=O)OCCCC)C(F)(F)F

nearest known ligand 0.52

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.52
ALDH1A1 P00352 1/20 0.47
HPGD P15428 1/20 0.46
ATM Q13315 1/20 0.44
CES2 O00748 3/20 0.42
FAAH O00519 8/20 0.39
HCAR2 Q8TDS4 1/20 0.39
ESR1 P03372 1/20 0.39
CES1 P23141 5/20 0.38
NAAA Q02083 1/20 0.38
MEN1 O00255 1/20 0.38
CYP1A2 P05177 1/20 0.38
KMT2A Q03164 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4651717 0.94 TSHR (0.59) TSHRALDH1A1CES2FAAHHCAR2
SCHEMBL20597710 0.93 TSHR (0.62) TSHRCES2FAAHHCAR2CES1
SCHEMBL20598100 0.93 TSHR (0.62) TSHRCES2FAAHHCAR2CES1
SCHEMBL27737049 0.93 TSHR (0.62) TSHRCES2FAAHHCAR2CES1
SCHEMBL11938099 0.93 TSHR (0.62) TSHRCES2FAAHHCAR2CES1
SCHEMBL27756373 0.93 TSHR (0.62) TSHRCES2FAAHHCAR2CES1
SCHEMBL303731 0.90 CES2 (0.45) TSHRCES2FAAHCES1MEN1
SCHEMBL303392 0.88 TSHR (0.41) TSHRALDH1A1CES2FAAHHCAR2
SCHEMBL16710938 0.88 TSHR (0.44) TSHRALDH1A1CES2NAAATDP1
SCHEMBL9745845 0.87 TSHR (0.50) TSHRALDH1A1HPGDATMCES2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105693908-A Method for wrapping thermal-expandable microspheres again 湖南方锐达科技有限公司 2016-06-22 CN claimed
CN-102585087-B Functional polyacrylic ester HUAIHAI INST TECHNOLOGY 2014-07-02 CN claimed
US-4613657-A APROTIC SOLVENT ALKALI METAL ALKOXIDE, OPTICS, PAINTS, RESISTS CENTRAL GLASS COMPANY, LIMITED (JP) 1986-09-23 US claimed
CN-117659799-A Coating composition, coating layer, preparation method of coating layer and part for vehicle steering system 一汽解放汽车有限公司 2024-03-08 CN disclosed
CN-112585113-B Process for distillative purification of fluorine-containing polymerizable monomers 中央硝子株式会社 2023-08-22 CN disclosed
US-11597696-B2 Method for purifying polymerizable fluoromonomer by distillation CENTRAL GLASS COMPANY, LIMITED (JP) 2023-03-07 US disclosed
US-20210317065-A1 Method for Purifying Polymerizable Fluoromonomer by Distillation CENTRAL GLASS COMPANY, LIMITED (JP) 2021-10-14 US disclosed
CN-108780918-B Solid electrolyte composition, sheet containing solid electrolyte, all-solid-state secondary battery, and methods for producing these 富士胶片株式会社 2021-07-27 CN disclosed
CN-112585113-A Method for purifying fluorine-containing polymerizable monomer by distillation 中央硝子株式会社 2021-03-30 CN disclosed
US-10833351-B2 Solid electrolyte composition, solid electrolyte-containing sheet, all-solid state secondary battery, and methods for manufacturing solid electrolyte composition, solid electrolyte-containing sheet, all-solid state secondary battery FUJIFILM CORPORATION (JP) 2020-11-10 US disclosed
US-10312546-B2 Non-aqueous liquid electrolyte for secondary battery and secondary battery FUJIFILM CORPORATION (JP) 2019-06-04 US disclosed
US-20080003529-A1 (Meth)Acrylate, Polymer and Resist Composition MITSUBISHI RAYON CO., LTD. (JP) 2008-01-03 US disclosed
US-20070190449-A1 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer MITSUBISHI RAYON CO., LTD. (JP) 2007-08-16 US disclosed
US-7199262-B2 3-Hydroxypropyl ester of 2-trifluoromethylacrylic acid and process for producing same CENTRAL GLASS COMPANY, LIMITED (JP) 2007-04-03 US disclosed
CN-1832973-A Fluorocopolymer, process for producing the same, and resist composition containing the same ASAHI GLASS CO LTD (JP) 2006-09-13 CN disclosed
US-20060127801-A1 Resist polymer and resist composition MITSUBISHI RAYON CO., LTD. (JP) 2006-06-15 US disclosed
US-20060122423-A1 Method for producing fluorine-containing acrylate SAGAMI CHEMICAL RESEARCH CENTER (JP) 2006-06-08 US disclosed
EP-1637514-A1 METHOD FOR PRODUCING FLUORINE-CONTAINING ACRYLATE Tosoh F-Tech, Inc. (JP) 2006-03-22 EP disclosed
US-5100762-A Radiation-sensitive polymer and radiation-sensitive composition containing the same MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1992-03-31 US disclosed
US-4613657-A APROTIC SOLVENT ALKALI METAL ALKOXIDE, OPTICS, PAINTS, RESISTS CENTRAL GLASS COMPANY, LIMITED (JP) 1986-09-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210317065-A1 Method for Purifying Polymerizable Fluoromonomer by Distillation AFF1, AFF4, AFF2 TSHR 3387/4885ALDH1A1 950/4885HPGD 3668/4885
US-11597696-B2 Method for purifying polymerizable fluoromonomer by distillation AFF1, AFF4, AFF2 TSHR 3387/4885ALDH1A1 950/4885HPGD 3668/4885
US-20060122423-A1 Method for producing fluorine-containing acrylate AFF4, CBR1, AFF1 TSHR 52/4885ALDH1A1 174/4885HPGD 843/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.