Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NR4A1 | P22736 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 4/20 | 0.38 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.38 |
| ▸ | FYN | P06241 | 1/20 | 0.38 |
| ▸ | MAOA | P21397 | 1/20 | 0.38 |
| ▸ | ACHE | P22303 | 1/20 | 0.38 |
| ▸ | AHR | P35869 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.36 |
| ▸ | HPGD | P15428 | 5/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.36 |
| ▸ | THRB | P10828 | 2/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.34 |
| ▸ | GLA | P06280 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL6752535 | 0.92 | NR4A1 (0.37) | NR4A1CYP1A2ERBB2FYNMAOA | |
| SCHEMBL2904110 | 0.89 | ALDH1A1 (0.38) | NR4A1CYP1A2ALDH1A1HPGDHSD17B10 | |
| SCHEMBL2903892 | 0.89 | HTT (0.39) | ALDH1A1HPGDTDP1L3MBTL1KMT2A | |
| SCHEMBL2903961 | 0.87 | NR4A1 (0.37) | NR4A1CYP1A2ERBB2FYNMAOA | |
| Toliodium SCHEMBL2900119 | 0.87 | ALDH1A1 (0.40) | NR4A1CYP1A2ERBB2FYNMAOA | |
| SCHEMBL31441383 | 0.85 | NR4A1 (0.46) | NR4A1CYP1A2ERBB2FYNMAOA | |
| SCHEMBL592127 | 0.85 | NR4A1 (0.46) | NR4A1CYP1A2ERBB2FYNMAOA | |
| SCHEMBL29557352 | 0.85 | NR4A1 (0.46) | NR4A1CYP1A2ERBB2FYNMAOA | |
| SCHEMBL453404 | 0.85 | NR1I2 (0.39) | NR4A1CYP1A2ERBB2FYNMAOA | |
| SCHEMBL38662137 | 0.85 | NR1I2 (0.39) | NR4A1CYP1A2ERBB2FYNMAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 510 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4563614-A1 | CURABLE COMPOSITION COMPRISING A MULTIFUNCTIONAL HALOGENATED THIOXANTHONE AND ITS USES | ARKEMA FRANCE (FR) | 2025-06-04 | — | — | EP | claimed |
| US-20140335448-A1 | PHOTOSENSITIVE SILOXANE RESIN COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-11-13 | — | — | US | claimed |
| US-RE37179-E1 | ADDITION POLYMER | JSR CORPORATION (JP) | 2001-05-15 | — | — | US | claimed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| US-5679495-A | TERPOLYMER PHOTORESIST CONTAINING VINYLPHENOL DERIVATIVE, TERT-BUTYL (METH)ACRYLATE, AND A UNIT TO REDUCE ALKALINE SOLUBILITY; DRY ETCH RESISTANCE | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-10-21 | — | — | US | claimed |
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| EP-4725976-A1 | POLYMERIC CYCLOALIPHATIC EPOXIDES | ARKEMA FRANCE (FR) | 2026-04-15 | — | — | EP | disclosed |
| EP-4563614-A1 | CURABLE COMPOSITION COMPRISING A MULTIFUNCTIONAL HALOGENATED THIOXANTHONE AND ITS USES | ARKEMA FRANCE (FR) | 2025-06-04 | — | — | EP | disclosed |
| WO-2025062940-A1 | RESIN COMPOSITION, SUBSTRATE WITH PIEZOELECTRIC FILM, AND METHOD FOR PRODUCING SUBSTRATE WITH PIEZOELECTRIC FILM | 東レ株式会社 | 2025-03-27 | — | — | WO | disclosed |
| CN-110850680-B | Curable composition, display element, and method for forming cured film | JSR株式会社 | 2024-10-25 | — | — | CN | disclosed |
| US-20240168383-A1 | STRUCTURE FOR OPTICAL DEVICES, PROCESS FOR PREPARING THE SAME, AND PHOTOCURABLE SILOXANE RESIN COMPOSITION THEREFOR | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2024-05-23 | — | — | US | disclosed |
| US-11970557-B2 | Polymer containing photoacid generator | LG CHEM, LTD. (KR) | 2024-04-30 | — | — | US | disclosed |
| EP-0789278-A2 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-08-13 | — | — | EP | disclosed |
| US-5629135-A | ALKALI-SOLUBLE RESIN, CROSSLINKER, PHOTOACID GENERATOR, SOLVENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-05-13 | — | — | US | disclosed |
| EP-0660187-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| EP-0726500-A1 | Chemically amplified, radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-08-14 | — | — | EP | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| EP-0634696-A1 | Chemically amplified resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-18 | — | — | EP | disclosed |
| EP-0523957-A1 | Radiation-sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-01-20 | — | — | EP | disclosed |