SCHEMBL2215560

SCHEMBL2215560

SN1Cc2c(ccc3ccccc23)S1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.38
MAPT P10636 2/20 0.38
HSD17B10 Q99714 4/20 0.38
ALDH1A1 P00352 3/20 0.38
CYP2A6 P11509 1/20 0.38
TSHR P16473 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
HPRT1 P00492 1/20 0.35
CYP2C19 P33261 3/20 0.33
CYP1A2 P05177 2/20 0.33
CYP2C9 P11712 2/20 0.33
GLA P06280 1/20 0.33
HPGD P15428 1/20 0.33
SIRT1 Q96EB6 1/20 0.33
HIF1A Q16665 1/20 0.33
CYP1B1 Q16678 1/20 0.33
USP2 O75604 1/20 0.32
PAK1 Q13153 1/20 0.32
VDR P11473 1/20 0.31
HTR2A P28223 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6241908 0.79 KDM4E (0.38) KDM4EMAPTHSD17B10ALDH1A1CYP2A6
SCHEMBL6241131 0.76 ALDH1A1 (0.40) KDM4EMAPTHSD17B10ALDH1A1CYP2A6
SCHEMBL9784311 0.67 HSD17B10 (0.46) KDM4EMAPTHSD17B10ALDH1A1CYP2A6
SCHEMBL5699226 0.67 HSD17B10 (0.41) KDM4EMAPTHSD17B10ALDH1A1CYP2A6
SCHEMBL3894929 0.65 RYR2 (0.36) KDM4EALDH1A1HPGD
SCHEMBL31712974 0.64 ALDH1A1 (0.38) KDM4EMAPTHSD17B10ALDH1A1CYP2A6
SCHEMBL926548 0.64 HSD17B10 (0.42) KDM4EMAPTHSD17B10ALDH1A1CYP2A6
SCHEMBL14983740 0.64 ALDH1A1 (0.44) KDM4EMAPTHSD17B10ALDH1A1CYP2A6
SCHEMBL30726708 0.64 ALDH1A1 (0.44) KDM4EMAPTHSD17B10ALDH1A1CYP2A6
SCHEMBL31712932 0.63 HSD17B10 (0.37) KDM4EHSD17B10ALDH1A1CYP2A6TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1952918-B1 METHOD FOR PRODUCING METAL PARTICLE DISPERSION, CONDUCTIVE INK USING METAL PARTICLE DISPERSION PRODUCED BY SUCH METHOD, AND CONDUCTIVE COATING FILM TOYO INK MFG CO (JP) 2013-05-22 EP disclosed
US-8440110-B2 Method for producing metal particle dispersion, conductive ink using metal particle dispersion produced by such method, and conductive coating film TOYO INK MFG CO., LTD. (JP) 2013-05-14 US disclosed
US-20110175040-A1 METHOD FOR PRODUCING METAL PARTICLE DISPRESION, CONDUCTIVE INK USING METAL PARTICLE DISPERSION PRODUCED BY SUCH METHOD, AND CONDUCTIVE COATING FILM TOYO INK MFG CO., LTD. (JP) 2011-07-21 US disclosed
US-7981327-B2 Method for producing metal particle dispersion, conductive ink using metal particle dispersion produced by such method, and conductive coating film TOYO INK MFG. CO. LTD. (JP) 2011-07-19 US disclosed
US-20090258202-A1 Method for Producing Metal Particle Dispersion, Conductive Ink Using Metal Particle Dispersion Produced by Such Method, and Conductive Coating Film GVP GESELLSCHAFT ZUR VERMARKTUNG DER PORENBRENNERTECHNIK MBH (DE) 2009-10-15 US disclosed
EP-1952918-A1 METHOD FOR PRODUCING METAL PARTICLE DISPERSION, CONDUCTIVE INK USING METAL PARTICLE DISPERSION PRODUCED BY SUCH METHOD, AND CONDUCTIVE COATING FILM Toyo Ink Mfg. Co., Ltd (JP) 2008-08-06 EP disclosed
EP-1072614-B1 Method for polymerizing vinyl monomers in a coated reactor SHINETSU CHEMICAL CO (JP) 2005-07-06 EP disclosed
EP-0934955-B1 Polymerization process characterized by a two layer coating against scale formation deposited using a steam carrier SHINETSU CHEMICAL CO (JP) 2003-04-16 EP disclosed
US-6362291-B1 PRETREATING VESSEL HAS ANTIDEPOSIT COATING SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-03-26 US disclosed
US-6335403-B1 ANTISCALING AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-01-01 US disclosed
EP-1072614-A1 Method for polymerizing vinyl monomers in a coated reactor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-01-31 EP disclosed
EP-1063242-A1 Process for producing a polymer by polymerization of a monomer having an ethylenic double bond SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-12-27 EP disclosed
EP-1043338-A1 Polymerisation process in a reactor with double coating against scale formation SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-10-11 EP disclosed
US-6096144-A TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-08-01 US disclosed
US-6037426-A POLYMERIZING MONOMER HAVING ETHYLENIC DOUBLE BOND IN POLYMERIZATION VESSEL HAVING BILAYER POLYMER SCALE PREVENTIVE COATING FILM ON INNER WALL SURFACES SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-03-14 US disclosed
EP-0934955-A1 Polymerization process characterized by a two layer coating against scale formation deposited using a steam carrier SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-08-11 EP disclosed
US-5858571-A TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-01-12 US disclosed
EP-0172427-B1 PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER Shin-Etsu Chemical Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4758639-A Process for production of vinyl polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-19 US disclosed
US-4757124-A Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-12 US disclosed