SCHEMBL221599

SCHEMBL221599

C=C(CCCOCC(C)C)C(=O)O

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.37
PLA2G2C Q5R387 1/20 0.32
TET2 Q6N021 3/20 0.31
TET3 O43151 1/20 0.31
TET1 Q8NFU7 1/20 0.31
SPHK2 Q9NRA0 1/20 0.31
SPHK1 Q9NYA1 1/20 0.31
TBXAS1 P24557 2/20 0.31
RAB9A P51151 1/20 0.31
GRIK1 P39086 1/20 0.31
GRIK2 Q13002 1/20 0.31
GRM1 Q13255 1/20 0.31
GRM2 Q14416 1/20 0.31
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2C19 P33261 1/20 0.30
KDM4E B2RXH2 1/20 0.30
USP2 O75604 1/20 0.30
ALDH1A1 P00352 1/20 0.30
ALOX15 P16050 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1759390 0.95 TSHR (0.36) TSHRPLA2G2CTET2TET3TET1
SCHEMBL550946 0.89 TSHR (0.39) TSHRTET2TET3TET1GRIK1
SCHEMBL3262135 0.87 HSD17B10 (0.44) TSHRPLA2G2CTET2TET3TET1
SCHEMBL3166404 0.83 ALOX15 (0.31) TSHRPLA2G2CCYP1A2CYP3A4CYP2C19
SCHEMBL11126565 0.82 TSHR (0.39) TSHRTET2TET3TET1TBXAS1
SCHEMBL8500710 0.81 TSHR (0.34) TSHR
SCHEMBL4923408 0.80
SCHEMBL2965589 0.79 EPHX2 (0.39) TSHRKDM4EALDH1A1
SCHEMBL33745 0.79 THRB (0.42) TSHRTBXAS1KDM4EALDH1A1
SCHEMBL21568510 0.77 NAMPT (0.37) TSHRKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1476509-B1 SELF-POLISHING ANTIFOULING PAINT JOTUN AS (NO) 2007-04-11 EP claimed
US-9733564-B2 Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions MITSUBISHI CHEMICAL CORPORATION (JP) 2017-08-15 US disclosed
US-20130224654-A1 COPOLYMERS FOR LITHOGRAPHY AND METHOD FOR PRODUCING SAME, RESIST COMPOSITION, METHOD FOR PRODUCING SUBSTRATE WITH PATTERN FORMED THEREUPON, METHOD FOR EVALUATING COPOLYMERS, AND METHOD FOR ANALYZING COPOLYMER COMPOSITIONS MITSUBISHI RAYON CO., LTD. (JP) 2013-08-29 US disclosed
US-8114949-B2 (Meth)acrylate, polymer and resist composition MITSUBISHI RAYON CO., LTD. (JP) 2012-02-14 US disclosed
US-8092979-B2 Resist polymer and resist composition MITSUBISHI RAYON CO., LTD. (JP) 2012-01-10 US disclosed
US-8088875-B2 (Meth)acrylate, polymer and resist composition MITSUBISHI RAYON CO., LTD. (JP) 2012-01-03 US disclosed
US-20080003529-A1 (Meth)Acrylate, Polymer and Resist Composition MITSUBISHI RAYON CO., LTD. (JP) 2008-01-03 US disclosed
EP-1476509-B1 SELF-POLISHING ANTIFOULING PAINT JOTUN AS (NO) 2007-04-11 EP disclosed
EP-1476509-A2 SELF-POLISHING ANTIFOULING PAINT Jotun AS (NO) 2004-11-17 EP disclosed
US-6706826-B1 COMONOMERS COMPRISING ALICYCLIC AND LACTONE STRUCTURES; HYDROPHOBIC AND HEAT RESISTANCE, SOLVENT SOLUBILITY; PAINTS MITSUBISHI RAYON CO., LTD. (JP) 2004-03-16 US disclosed
WO-2003070832-A2 SELF-POLISHING ANTIFOULING PAINT JOTUN AS (NO) 2003-08-28 WO disclosed