SCHEMBL2216097

SCHEMBL2216097

C=C(C)C(=O)OC(=O)OC(C)(C)C

nearest known ligand 0.42

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.42
TSHR P16473 3/20 0.34
TDP1 Q9NUW8 2/20 0.33
HSD17B10 Q99714 1/20 0.33
ELANE P08246 1/20 0.33
THRB P10828 1/20 0.32
DGAT1 O75907 1/20 0.32
HDAC1 Q13547 1/20 0.31
HDAC2 Q92769 1/20 0.31
HDAC6 Q9UBN7 1/20 0.31
USP2 O75604 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6354215 0.81 HSD17B10 (0.48) ALDH1A1TSHRTDP1HSD17B10ELANE
SCHEMBL28298942 0.80 ALDH1A1 (0.50) ALDH1A1TSHRTDP1HSD17B10ELANE
SCHEMBL33412 0.80 ALDH1A1 (0.50) ALDH1A1TSHRTDP1HSD17B10ELANE
SCHEMBL28182228 0.80 ELANE (0.32) ELANEDGAT1HDAC1HDAC2HDAC6
SCHEMBL1976402 0.80 ALDH1A1 (0.55) ALDH1A1TSHRTDP1HSD17B10ELANE
SCHEMBL4725721 0.78 ELANE (0.36) TDP1HSD17B10ELANEDGAT1HDAC1
Ethylene SCHEMBL16830236 0.78 ALDH1A1 (0.48) ALDH1A1TSHRTDP1HSD17B10THRB
Methane SCHEMBL28207399 0.78 ALDH1A1 (0.48) ALDH1A1TSHRTDP1HSD17B10THRB
Ammonia Solution, Strong SCHEMBL1022660 0.78 ALDH1A1 (0.48) ALDH1A1TSHRTDP1HSD17B10THRB
SCHEMBL28184760 0.78 ALDH1A1 (0.48) ALDH1A1TSHRTDP1HSD17B10THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US claimed
EP-4604914-A1 ORAL CARE COMPOSITIONS Colgate-Palmolive Company (US) 2025-08-27 EP disclosed
CN-114286668-A Local, sustained, controlled release implantable depot of therapeutic agents for treating cancer and related symptoms and conditions 铸造疗法股份有限公司 2022-04-05 CN disclosed
CN-106462058-B Photosensitive polymer combination, the manufacturing method of conductive pattern, substrate, element and touch panel 东丽株式会社 2019-08-13 CN disclosed
CN-107207674-A Easy Wrecking property resin film formation composition and easy Wrecking property resin film 日产化学工业株式会社 2017-09-26 CN disclosed
CN-106462058-A Photosensitive resin composition, method for manufacturing conductive pattern, substrate, element, and touch screen 东丽株式会社 2017-02-22 CN disclosed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US disclosed
US-20090130419-A1 FOAM SHEET AND PRODUCTION PROCESS THEREOF OJI PAPER CO., LTD (JP) 2009-05-21 US disclosed
US-20060210785-A1 Foamed product in a sheet form and method for production thereof OJI PAPER CO., LTD. (JP) 2006-09-21 US disclosed
EP-1647570-A1 FOAMED PRODUCT IN A SHEET FORM AND METHOD FOR PRODUCTION THEREOF Oji Paper Co., Ltd. (JP) 2006-04-19 EP disclosed
EP-1004936-B1 RESIST RESIN, RESIST RESIN COMPOSITION, AND PROCESS FOR PATTERNING THEREWITH SHOWA DENKO KK (JP) 2003-10-08 EP disclosed
US-6303268-B1 SENSITIVITY TO RADIATION SHOWA DENKO K.K. (JP) 2001-10-16 US disclosed
EP-1004936-A1 RESIST RESIN, RESIST RESIN COMPOSITION, AND PROCESS FOR PATTERNING THEREWITH Showa Denko K K (JP) 2000-05-31 EP disclosed
US-5891935-A Process for preparing polymeric binders and their use for antifouling paint systems WITCO GMBH (DE) 1999-04-06 US disclosed