SCHEMBL33412

SCHEMBL33412

C=C(C)C(=O)OC(C)(C)C

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.50
TSHR P16473 3/20 0.39
DGAT1 O75907 1/20 0.37
THRB P10828 1/20 0.37
TDP1 Q9NUW8 2/20 0.36
HSD17B10 Q99714 1/20 0.33
GAA P10253 1/20 0.32
ELANE P08246 1/20 0.31
USP2 O75604 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL1022660 0.97 ALDH1A1 (0.48) ALDH1A1TSHRDGAT1THRBTDP1
Ethylene SCHEMBL16830236 0.97 ALDH1A1 (0.48) ALDH1A1TSHRDGAT1THRBTDP1
Dimethylamine SCHEMBL9576612 0.93 ALDH1A1 (0.50) ALDH1A1TSHRDGAT1THRBTDP1
Methacrylic Acid SCHEMBL4637357 0.93 ALDH1A1 (0.44) ALDH1A1TSHRDGAT1THRBTDP1
Methacrylic Acid SCHEMBL6011830 0.93 ALDH1A1 (0.44) ALDH1A1TSHRDGAT1THRBTDP1
Methacrylic Acid SCHEMBL1730167 0.91 ALDH1A1 (0.42) ALDH1A1TSHRDGAT1THRBTDP1
SCHEMBL1820007 0.91 ALDH1A1 (0.68) ALDH1A1TSHRDGAT1THRBTDP1
SCHEMBL1798280 0.91 ALDH1A1 (0.68) ALDH1A1TSHRDGAT1THRBTDP1
SCHEMBL8398377 0.91 ALDH1A1 (0.42) ALDH1A1TSHRDGAT1THRBTDP1
SCHEMBL436660 0.89 TSHR (0.43) ALDH1A1TSHRDGAT1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 54661 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260146120-A1 COPOLYMER FOR SEPARATOR AND SECONDARY BATTERY COMPRISING SAME HANSOL CHEMICAL CO., LTD (KR) 2026-05-28 US claimed
US-20260147278-A1 ORGANIC UNDERLAYER AND METHODS FOR EUV DOSE REDUCTION BREWER SCIENCE, INC. (US) 2026-05-28 US claimed
CN-122080317-A Method for preparing low-glossiness low-odor ABS resin and application thereof 2026-05-26 CN claimed
CN-122081917-A Low-temperature quick-setting self-repairing chromium-free passivation solution and preparation method and application thereof 2026-05-26 CN claimed
CN-122080857-A Battery negative electrode adhesive with topological structure, and preparation method and application thereof 2026-05-26 CN claimed
CN-122080336-A High-water-resistance adhesive-force adhesive cement emulsion and preparation method thereof 2026-05-26 CN claimed
CN-121108418-B Waterproof and oilproof acrylate emulsion and preparation method and application thereof Zhongshan Bolimi New Material Technology Co.,Ltd. (CN) 2026-05-26 CN claimed
CN-122080329-A Polycarboxylic acid composite water reducer for roller compacted concrete and preparation method thereof 2026-05-26 CN claimed
CN-119080993-B Polymer with efficient and long-acting emulsion breaking and coalescing functions of emulsified water and preparation method and application thereof 华南理工大学 2026-05-22 CN claimed
US-20260139085-A1 COPOLYMER FOR SEPARATOR AND SECONDARY BATTERY COMPRISING SAME HANSOL CHEMICAL CO LTD (KR) 2026-05-21 US claimed
US-4102842-A DRYING A SAPONIFIED COPOLYMER OF A VINYL ESTER AND AN ACRYLIC ACID DERIVATIVE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1978-07-25 US claimed
US-4048136-A ACRYLIC RESINS, ENCAPSULATED METAL POWDERS, ALUMINUM MITSUI TOATSU KAGAKU KABUSHIKI KAISHA (MITSUI TOATSU CHEM., INC.) (JA) 1977-09-13 US claimed
US-4046727-A Thermosettable acrylic resin composition for powder coating SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1977-09-06 US claimed
US-4042766-A MELT BLENDING SUMITOMO CHEMICAL COMPANY, LIMITED (JA) 1977-08-16 US claimed
US-4022831-A MULTISTAGE, MULTIZONAL; METHACRYLIC ACID, AMINES IN A BASIC CATALYST THE GOODYEAR TIRE & RUBBER COMPANY (US) 1977-05-10 US claimed
US-4014842-A GRAFT POLYMERS KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JA) 1977-03-29 US claimed
US-4011351-A HIGH ENERGY RADIATION, PHOTORESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1977-03-08 US claimed
US-3996393-A Positive polymeric electron beam resists of very great sensitivity INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1976-12-07 US claimed
US-3984582-A Method for preparing positive resist image IBM (US) 1976-10-05 US claimed
US-3945970-A PRIMARY AMINES, METHACRYLIC ESTER, BASIC METALLIC CATALYSTS, COMONOMERS, ANTIOXIDANTS THE GOODYEAR TIRE & RUBBER COMPANY (US) 1976-03-23 US claimed