SCHEMBL22200937

SCHEMBL22200937

C=C(C)C(=O)Nc1ccc(O)c(C)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 3/20 0.54
RXFP1 Q9HBX9 1/20 0.51
POLB P06746 3/20 0.49
L3MBTL1 Q9Y468 3/20 0.49
RECQL P46063 1/20 0.49
BLM P54132 1/20 0.49
HSP90AA1 P07900 1/20 0.47
HSP90AB1 P08238 1/20 0.47
BAZ1A Q9NRL2 1/20 0.45
RAB9A P51151 3/20 0.42
KDM4E B2RXH2 1/20 0.42
ALDH1A1 P00352 3/20 0.41
TNIK Q9UKE5 1/20 0.41
RORC P51449 1/20 0.41
NPC1 O15118 2/20 0.41
LMNA P02545 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
CYP1A2 P05177 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21050613 0.86 TDP1 (0.57) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL30853148 0.86 TDP1 (0.57) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL10315635 0.86 POLB (0.59) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL6880349 0.85 TDP1 (0.50) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL10864160 0.83 POLB (0.55) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL15782653 0.83 TDP1 (0.54) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL7547627 0.82 ALDH1A1 (0.59) TDP1POLBL3MBTL1HSP90AA1HSP90AB1
SCHEMBL2765530 0.81 TDP1 (0.53) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL22200962 0.81 TDP1 (0.57) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL22200948 0.81 TDP1 (0.53) TDP1RXFP1POLBL3MBTL1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230305398-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20230305398-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20200218154-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-09 US disclosed