SCHEMBL22200948

SCHEMBL22200948

C=C(C)C(=O)Nc1ccc(O)c(I)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.53
RXFP1 Q9HBX9 1/20 0.50
POLB P06746 3/20 0.48
L3MBTL1 Q9Y468 2/20 0.48
RECQL P46063 1/20 0.48
BLM P54132 1/20 0.48
BAZ1A Q9NRL2 1/20 0.44
PKM P14618 1/20 0.38
ALDH1A1 P00352 4/20 0.38
KDM4E B2RXH2 2/20 0.38
EGFR P00533 1/20 0.38
ERBB2 P04626 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.37
MAPT P10636 2/20 0.35
MEN1 O00255 1/20 0.35
CA12 O43570 1/20 0.35
BRD4 O60885 1/20 0.35
NR1I2 O75469 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21050613 0.84 TDP1 (0.57) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL30853148 0.84 TDP1 (0.57) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL22374212 0.82 PKM (0.54) TDP1POLBL3MBTL1PKMALDH1A1
SCHEMBL10864160 0.81 POLB (0.55) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL22200937 0.81 TDP1 (0.54) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL15782653 0.81 TDP1 (0.54) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL7754176 0.80 TDP1 (0.53) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL22200962 0.80 TDP1 (0.57) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL22200938 0.80 TDP1 (0.53) TDP1RXFP1POLBL3MBTL1RECQL
SCHEMBL11998343 0.79 TDP1 (0.51) TDP1RXFP1POLBL3MBTL1RECQL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230305398-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20230305398-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20200218154-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-09 US disclosed