SCHEMBL22200958

SCHEMBL22200958

C=C(C)COC1(C(C)(C)C)CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11110482 0.71 — —
SCHEMBL14608823 0.69 — —
SCHEMBL12013174 0.68 ALDH1A1 (0.38) —
SCHEMBL25122099 0.68 — —
SCHEMBL25456171 0.67 — —
SCHEMBL22236883 0.67 — —
SCHEMBL263136 0.67 ALDH1A1 (0.37) —
SCHEMBL12521054 0.67 ALDH1A1 (0.37) —
SCHEMBL20079477 0.67 — —
SCHEMBL12521232 0.67 ALDH1A1 (0.37) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200218154-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-09 — — US disclosed
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