SCHEMBL20079477

SCHEMBL20079477

C=C(C)C(O)OC1(C(C)(C)C)CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23309553 0.74 — —
SCHEMBL22767946 0.71 — —
SCHEMBL22788076 0.69 — —
SCHEMBL23921344 0.69 — —
SCHEMBL18553105 0.69 — —
SCHEMBL22064296 0.68 — —
SCHEMBL22200958 0.67 — —
SCHEMBL12013174 0.67 ALDH1A1 (0.38) —
SCHEMBL23864901 0.66 SLC6A4 (0.30) —
SCHEMBL12521054 0.65 ALDH1A1 (0.37) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9952509-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-04-24 — — US disclosed
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