Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.34 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 3/20 | 0.33 |
| ▸ | ADRA2C | P18825 | 2/20 | 0.33 |
| ▸ | MAOA | P21397 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.33 |
| ▸ | HRH2 | P25021 | 1/20 | 0.32 |
| ▸ | HTR2B | P41595 | 1/20 | 0.32 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22201794 | 0.74 | OPRL1 (0.32) | — | |
| SCHEMBL22201793 | 0.71 | ADORA2A (0.32) | MEN1KMT2A | |
| SCHEMBL22201773 | 0.70 | SLC6A3 (0.51) | CHRM4CHRM2CHRM5SLC6A3ADRA2C | |
| SCHEMBL22201768 | 0.69 | SPHK1 (0.34) | KMT2A | |
| SCHEMBL6452433 | 0.68 | KDM1A (0.36) | HTR2B | |
| SCHEMBL6452440 | 0.68 | KDM1A (0.36) | HTR2B | |
| SCHEMBL8375638 | 0.68 | MAOA (0.53) | SLC6A3MAOAMAOB | |
| SCHEMBL11156621 | 0.66 | KDM1A (0.39) | MEN1KMT2ACHRM4 | |
| SCHEMBL11156616 | 0.66 | KDM1A (0.39) | MEN1KMT2ACHRM4 | |
| SCHEMBL16241618 | 0.66 | HPGD (0.46) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200216670-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |