Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 12/20 | 0.52 |
| ▸ | HTR2C | P28335 | 12/20 | 0.52 |
| ▸ | OPRL1 | P41146 | 3/20 | 0.42 |
| ▸ | BCHE | P06276 | 1/20 | 0.41 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.40 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | CEL | P19835 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8148467 | 0.95 | HTR2A (0.56) | HTR2AHTR2COPRL1SLC6A4KCNH2 | |
| SCHEMBL16191075 | 0.89 | HTR2A (0.58) | HTR2AHTR2COPRL1KCNH2KDM4E | |
| SCHEMBL8154321 | 0.87 | HTR2A (0.53) | HTR2AHTR2CBCHESLC6A4KCNH2 | |
| SCHEMBL8147279 | 0.86 | HTR2A (0.56) | HTR2AHTR2COPRL1KCNH2KDM4E | |
| SCHEMBL8146275 | 0.85 | HTR2A (0.52) | HTR2AHTR2COPRL1BCHESLC6A4 | |
| SCHEMBL8145957 | 0.84 | HTR2A (0.51) | HTR2AHTR2COPRL1BCHESLC6A4 | |
| SCHEMBL8152477 | 0.84 | HTR2A (0.51) | HTR2AHTR2COPRL1BCHESLC6A4 | |
| SCHEMBL8153366 | 0.83 | HTR2A (0.56) | HTR2AHTR2COPRL1SLC6A4KCNH2 | |
| SCHEMBL28027009 | 0.83 | HTR2A (0.43) | HTR2AHTR2CSLC6A4 | |
| SCHEMBL10019544 | 0.82 | HTR2A (0.42) | HTR2AHTR2C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200216670-A1 | THERMOSETTING SILICON-CONTAINING COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |