SCHEMBL2220733

SCHEMBL2220733

COCc1cc(C)ccc1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AMY1A P0DUB6 1/20 0.55
TRPA1 O75762 1/20 0.48
PRKCE Q02156 3/20 0.47
MAPT P10636 3/20 0.47
TDP1 Q9NUW8 2/20 0.47
MYLK Q15746 2/20 0.47
ALDH1A1 P00352 2/20 0.47
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
PRKCG P05129 1/20 0.47
PRKCA P17252 1/20 0.47
APEX1 P27695 1/20 0.47
RECQL P46063 1/20 0.47
TP53 P04637 2/20 0.46
HTT P42858 2/20 0.45
ALOX15 P16050 3/20 0.43
HSD17B10 Q99714 2/20 0.43
ALOX12 P18054 2/20 0.42
LMNA P02545 2/20 0.42
HPGD P15428 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6712520 0.83 PRKCE (0.50) PRKCEMAPTTDP1MYLKALDH1A1
SCHEMBL8256542 0.80 KDM4E (0.41) AMY1APRKCEMAPTTDP1MYLK
SCHEMBL27873503 0.80 AMY1A (0.52) AMY1ATRPA1MAPTTDP1ALDH1A1
SCHEMBL10204852 0.80 AMY1A (0.52) AMY1ATRPA1MAPTTDP1ALDH1A1
SCHEMBL25446709 0.79 PRKCE (0.47) TRPA1PRKCEMAPTTDP1MYLK
SCHEMBL791955 0.78 TAAR1 (0.52) TDP1ALDH1A1MEN1KMT2AHTT
SCHEMBL29402131 0.78 AMY1A (0.83) AMY1ATRPA1MAPTTDP1ALDH1A1
SCHEMBL9008165 0.78 AMY1A (0.63) AMY1ATRPA1MAPTTDP1ALDH1A1
SCHEMBL29621432 0.78 AMY1A (0.83) AMY1ATRPA1MAPTTDP1ALDH1A1
SCHEMBL50622 0.78 AMY1A (0.83) AMY1ATRPA1MAPTTDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US claimed
CN-116940897-A Photosensitive resin composition and organic EL element partition wall 株式会社力森诺科 2023-10-24 CN disclosed
CN-113820920-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2023-07-04 CN disclosed
CN-115718406-A Photosensitive resin composition for forming resist, resin film, cured film, and semiconductor device 住友电木株式会社 2023-02-28 CN disclosed
CN-110095941-B Photosensitive resin composition and method for producing semiconductor element 东丽株式会社 2023-02-17 CN disclosed
CN-110088680-B Double-layer photosensitive layer roll 旭化成株式会社 2022-12-30 CN disclosed
CN-115185157-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2022-10-14 CN disclosed
CN-109153841-B Resin composition 东丽株式会社 2021-12-31 CN disclosed
CN-113820920-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2021-12-21 CN disclosed
CN-107850844-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2021-09-07 CN disclosed
US-20110177454-A1 RESIST MATERIAL AND PATTERN FORMATION METHOD USING THE RESIST MATERIAL PANASONIC CORPORATION (JP) 2011-07-21 US disclosed
EP-2255829-A2 Pharmaceutical composition for treatment of diseases associated with decrease in bone mass comprising EP4 agonist as active ingredient Ono Pharmaceutical Co., Ltd. (JP) 2010-12-01 EP disclosed
US-7737291-B2 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition ADEKA CORPORATION (JP) 2010-06-15 US disclosed
US-7737291-B2 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition ADEKA CORPORATION (JP) 2010-06-15 US disclosed
US-20100010222-A1 PHARMACEUTICAL COMPOSITION FOR TREATMENT OF DISEASES ASSOCIATED WITH DECREASE IN BONE MASS COMPRISING EP4 AGONIST AS ACTIVE INGREDIENT ONO PHARMACEUTICAL CO., LTD. (JP) 2010-01-14 US disclosed
US-20100010222-A1 PHARMACEUTICAL COMPOSITION FOR TREATMENT OF DISEASES ASSOCIATED WITH DECREASE IN BONE MASS COMPRISING EP4 AGONIST AS ACTIVE INGREDIENT ONO PHARMACEUTICAL CO., LTD. (JP) 2010-01-14 US disclosed
US-7608637-B2 Pharmaceutical composition for treatment of diseases associated with decrease in bone mass comprising EP4 agonist as the active ingredient ONO PHARMACEUTICAL CO., LTD. (JP) 2009-10-27 US disclosed
US-7608637-B2 Pharmaceutical composition for treatment of diseases associated with decrease in bone mass comprising EP4 agonist as the active ingredient ONO PHARMACEUTICAL CO., LTD. (JP) 2009-10-27 US disclosed
US-20070232821-A1 Composition Containing Siloxane Compound and Phenol Compound ADEKA CORPORATION (JP) 2007-10-04 US disclosed
US-20070232821-A1 Composition Containing Siloxane Compound and Phenol Compound ADEKA CORPORATION (JP) 2007-10-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070232821-A1 Composition Containing Siloxane Compound and Phenol Compound H1-0, CYP2S1, H1-4 AMY1A 2335/4885TRPA1 809/4885PRKCE 4726/4885
US-20100010222-A1 PHARMACEUTICAL COMPOSITION FOR TREATMENT OF DISEASES ASSOCIATED WITH DECREASE IN BONE MASS COMPRISING EP4 AGONIST AS ACTIVE INGREDIENT PTGER4, PTGER1, PTGER2 AMY1A 1704/4885TRPA1 1575/4885PRKCE 355/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.