SCHEMBL27873503

SCHEMBL27873503

CCOCc1cc(C)ccc1O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AMY1A P0DUB6 1/20 0.52
TRPA1 O75762 1/20 0.45
TP53 P04637 2/20 0.43
TDP1 Q9NUW8 1/20 0.43
HTT P42858 1/20 0.42
ALOX15 P16050 3/20 0.41
HSD17B10 Q99714 2/20 0.41
ALDH1A1 P00352 1/20 0.41
CA12 O43570 3/20 0.40
CA1 P00915 3/20 0.40
CA2 P00918 3/20 0.40
CA7 P43166 3/20 0.40
CA9 Q16790 3/20 0.40
CA14 Q9ULX7 3/20 0.40
NPSR1 Q6W5P4 1/20 0.40
LMNA P02545 2/20 0.39
HPGD P15428 2/20 0.39
MEN1 O00255 2/20 0.39
GAA P10253 2/20 0.39
MAPT P10636 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10204855 0.81 AMY1A (0.49) AMY1ATRPA1TP53TDP1HTT
SCHEMBL792462 0.80 TACR1 (0.50) TDP1HTTHSD17B10ALDH1A1NPSR1
SCHEMBL2220733 0.80 AMY1A (0.55) AMY1ATRPA1TP53TDP1HTT
SCHEMBL7761828 0.79 PRKCI (0.58) TDP1ALOX15HSD17B10ALDH1A1CA1
SCHEMBL11871516 0.79 AMY1A (0.46) AMY1ATRPA1TP53TDP1HTT
Hydrochloric Acid SCHEMBL9758701 0.78 ACHE (0.59) TP53TDP1HTTALOX15HSD17B10
SCHEMBL22724750 0.78 AMY1A (0.42) AMY1ATDP1HSD17B10ALDH1A1CA12
Ether SCHEMBL11154568 0.78 GABRA1 (0.54) AMY1ATRPA1HTTALDH1A1NPSR1
SCHEMBL1023280 0.77 AMY1A (0.61) AMY1ATRPA1TP53TDP1HTT
SCHEMBL3432857 0.76 KDM4E (0.41) TP53TDP1HTTHSD17B10ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102725694-B Photosensitive polymer composition, method for producing pattern, and electronic component HITACHI CHEM DUPONT MICROSYS 2015-05-27 CN disclosed
CN-102713756-B Light-sensitive polymer composition, method for producing pattern, and electronic component HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2014-10-15 CN disclosed
CN-102725694-A Photosensitive polymer composition, method for producing pattern, and electronic component HITACHI CHEM DUPONT MICROSYS 2012-10-10 CN disclosed
CN-102713756-A Light-sensitive polymer composition, method for producing pattern, and electronic component HITACHI CHEM DUPONT MICROSYS 2012-10-03 CN disclosed