Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.52 |
| ▸ | HPGD | P15428 | 4/20 | 0.52 |
| ▸ | MEN1 | O00255 | 3/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.52 |
| ▸ | GLA | P06280 | 2/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.52 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.52 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.52 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.49 |
| ▸ | POLB | P06746 | 2/20 | 0.49 |
| ▸ | HTR2A | P28223 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | ME2 | P23368 | 1/20 | 0.41 |
| ▸ | ME1 | P48163 | 1/20 | 0.41 |
| ▸ | ME3 | Q16798 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL16412160 | 0.90 | ALDH1A1 (0.46) | ALDH1A1HPGDMEN1KMT2AKDM4E | |
| Ethane SCHEMBL1070226 | 0.88 | HTR2A (0.56) | ALDH1A1HPGDMEN1KMT2AKDM4E | |
| SCHEMBL59671 | 0.88 | HTR2A (0.60) | ALDH1A1HPGDMEN1KMT2AKDM4E | |
| SCHEMBL29367221 | 0.88 | HTR2A (0.60) | ALDH1A1HPGDMEN1KMT2AKDM4E | |
| Alcohol SCHEMBL2553967 | 0.86 | HTR2A (0.54) | ALDH1A1HPGDMEN1KMT2AKDM4E | |
| Methane SCHEMBL27842569 | 0.86 | HTR2A (0.58) | ALDH1A1HPGDMEN1KMT2AKDM4E | |
| Acrylic Acid SCHEMBL4813410 | 0.84 | ALDH1A1 (0.47) | ALDH1A1HPGDMEN1KMT2AKDM4E | |
| SCHEMBL7929967 | 0.83 | ALDH1A1 (0.61) | ALDH1A1HPGDMEN1KMT2AKDM4E | |
| Acetic Acid SCHEMBL28094250 | 0.79 | HSD17B10 (0.46) | ALDH1A1HPGDMEN1KMT2AKDM4E | |
| SCHEMBL7941454 | 0.79 | ALDH1A1 (0.41) | ALDH1A1HPGDMEN1KMT2AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250171566-A1 | LIQUID, HYBRID UV/VIS RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | STRATASYS INC (US) | 2025-05-29 | — | — | US | claimed |
| US-6068962-A | NOVOLAK RESIN AS AN ALKALI-SOLUBLE COMPONENT; QUINONEDIAZIDE; ACID GENERATOR; ANTHRACENE DERIVATIVE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-05-30 | — | — | US | claimed |
| US-20250230272-A1 | MATERIALS FOR FREE-RADICAL ACTIVATION OF A LATENT CATALYST FOR RING-OPENING METATHESIS POLYMERIZATION (ROMP) AND USES THEREOF | Inkbit, LLC | 2025-07-17 | — | — | US | disclosed |
| EP-2868692-B2 | Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication | STRATASYS INC (US) | 2025-07-16 | — | — | EP | disclosed |
| US-20250171566-A1 | LIQUID, HYBRID UV/VIS RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | STRATASYS INC (US) | 2025-05-29 | — | — | US | disclosed |
| US-12296528-B2 | Compositions and articles for additive fabrication and methods of using the same in particle image velocimetry testing | STRATASYS, INC. (US) | 2025-05-13 | — | — | US | disclosed |
| US-12269933-B2 | Stabilized matrix-filled liquid radiation curable resin compositions for additive fabrication | STRATASYS, INC. (US) | 2025-04-08 | — | — | US | disclosed |
| US-12252561-B2 | Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication | STRATASYS, INC. (US) | 2025-03-18 | — | — | US | disclosed |
| EP-4491679-A2 | STABILIZED MATRIX-FILLED LIQUID RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | Stratasys, Inc. (US) | 2025-01-15 | — | — | EP | disclosed |
| EP-3827955-B1 | IMPROVED ANTIMONY-FREE RADIATION CURABLE COMPOSITIONS FOR ADDITIVE FABRICATION, AND APPLICATIONS THEREOF IN INVESTMENT CASTING PROCESSES | STRATASYS INC (US) | 2025-01-01 | — | — | EP | disclosed |
| EP-3971235-B1 | STABILIZED MATRIX-FILLED LIQUID RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | STRATASYS INC (US) | 2025-01-01 | — | — | EP | disclosed |
| US-20120251841-A1 | LIQUID RADIATION CURABLE RESINS FOR ADDITIVE FABRICATION COMPRISING A TRIARYL SULFONIUM BORATE CATIONIC PHOTOINITIATOR | DSM IP ASSETS, B.V. (NL) | 2012-10-04 | — | — | US | disclosed |
| EP-2502728-A1 | Lightweight and High Strength Three-Dimensional Articles Producible by Additive Fabrication Processes | DSM IP Assets B.V. (NL) | 2012-09-26 | — | — | EP | disclosed |
| EP-2396299-A1 | LIQUID RADIATION CURABLE RESINS FOR ADDITIVE FABRICATION COMPRISING A TRIARYL SULFONIUM BORATE CATIONIC PHOTOINITIATOR | DSM IP Assets B.V. (NL) | 2011-12-21 | — | — | EP | disclosed |
| WO-2011091228-A1 | LIQUID RADIATION CURABLE RESINS CAPABLE OF CURING INTO LAYERS WITH SELECTIVE VISUAL EFFECTS AND METHODS FOR THE USE THEREOF | DSM IP ASSETS B.V. (NL) | 2011-07-28 | — | — | WO | disclosed |
| WO-2011084578-A1 | SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS | DSM IP ASSETS, B.V. (NL) | 2011-07-14 | — | — | WO | disclosed |
| WO-2011075555-A1 | LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION | DSM IP ASSETS, B.V. (NL) | 2011-06-23 | — | — | WO | disclosed |
| WO-2011075553-A1 | LIQUID RADIATION CURABLE RESINS FOR ADDITIVE FABRICATION COMPRISING A TRIARYL SULFONIUM BORATE CATIONIC PHOTOINITIATOR | DSM IP ASSETS, B.V. (NL) | 2011-06-23 | — | — | WO | disclosed |
| US-6068962-A | NOVOLAK RESIN AS AN ALKALI-SOLUBLE COMPONENT; QUINONEDIAZIDE; ACID GENERATOR; ANTHRACENE DERIVATIVE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-05-30 | — | — | US | disclosed |
| EP-0831371-A2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-03-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120251841-A1 | LIQUID RADIATION CURABLE RESINS FOR ADDITIVE FABRICATION COMPRISING A TRIARYL SULFONIUM BORATE CATIONIC PHOTOINITIATOR | TERB1, ATR, LRRFIP1 | ALDH1A1 3415/4885HPGD 4042/4885MEN1 3737/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.